Water-based flux cleaning agent for semiconductors HYDRON SE 230A
Low surface tension is a characteristic! It provides good cleaning results even in narrow spaces.
"HYDRON SE 230A" is a one-phase type water-based cleaning agent for immersion processes. It reliably removes flux residues generated during die attach from various semiconductors such as lead frames, discrete components, power modules, power LEDs, flip chips, and CMOS. Additionally, it excels in removing oxide films from copper substrates in post-processes such as wire bonding and molding. 【Features】 ■ Activates copper substrates without staining and maintains the activated surface for a certain period ■ Excellent material compatibility with highly sensitive materials ■ Superior flux removal after wafer bump formation ■ Easy process management due to its one-phase structure, demonstrating excellent performance in immersion processes ■ Good rinsing properties with ion-exchanged water, leaving no residues *For more details, please refer to the PDF document or feel free to contact us.
- Company:ゼストロンジャパン
- Price:Other