Vacuum Device Thin Fluid Analysis Software 'DSMC-Neutrals'
Analysis of gas flow under low pressure conditions; analysis software compatible with rarefied gases (rarefied fluids).
【Features】 ■ Adopts unstructured mesh, allowing for calculations that accurately reflect the complex shapes of actual devices. ■ High parallel efficiency enables quick computation results even for large-scale geometries. ■ Utilizes a particle method, ensuring convergence to a solution even with poor quality computational grids, unlike fluid models. ■ Comprehensive technical support ensures that even those new to simulation or busy with experiments can reliably achieve results. ◆ Supports various cases ◆ - Simulation of rarefied gas flow within a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Simulation of thin film generation in semiconductor manufacturing processes such as Chemical Vapor Deposition (CVD), Organic Light Emitting Diodes (OLED), and Molecular Beam Epitaxy (MBE). ◆ Outputs various computation results ◆ - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions. - Ability to set multiple reaction equations on the GUI. * For more details, please refer to the catalog or feel free to contact us.
- Company:ウェーブフロント 本社
- Price:Other