High-Precision Parallel Kinematics P-733.2 for Semiconductor Manufacturing
Reproducibility ±1nm, XY axis 100µm stroke. High-precision nanopositioner for semiconductor manufacturing equipment.
In the semiconductor manufacturing field, extremely high precision and stability are required for the positioning of wafers and masks. With the advancement of miniaturization, we have entered an era where nanometer-level positioning errors directly affect device performance and yield. Particularly in exposure and inspection equipment, precise control that combines reproducibility and stability is essential. The P-733.2 achieves high-precision XY nanopositioning with a reproducibility of ±1nm. With a 100µm stroke and a high-rigidity parallel kinematics structure, it is also suitable for integration into semiconductor manufacturing equipment. High-precision positioning contributes to process stabilization and yield improvement. 【Application Scenarios】 - Exposure equipment - Mask/Wafer positioning - Inspection and measurement equipment 【Benefits of Implementation】 - Process stabilization with reproducibility of ±1nm - Yield improvement through high-precision positioning - Maximization of equipment performance through stable operation
- Company：PI Japan
- Price：Other
