ハニー化成 Product Lineup

"Hani Resist AP" is a fine processing positive-type resist electrocoating agent developed based on the electrocoating technology for aluminum building materials (electrocoating resin synthesis technology, electrocoating liquid management technology, electrocoating process technology) that has been cultivated over many years by Honey Kasei and is pioneering in the world. It enables high-speed processing via Reel to Reel for printed circuit boards and COF/TCP (film formation possible in 10 seconds of energization) and allows for fine processing. It also excels in processing capabilities within through-holes, making it easy to form coatings on three-dimensional structures. 【Features】 ■ High-speed processing ■ High resolution ■ Uniform coating thickness ■ Alkaline development, alkaline stripping type *For more details, please refer to the catalog or feel free to contact us.

The "Hani Resist E Series" is a negative-type photoresist electroplating treatment agent developed based on our pioneering electrocoating technology for aluminum building materials (electrocoating resin synthesis technology, electrocoating liquid management technology, electrocoating process technology). Due to its superior adhesion compared to other electrocoating liquids, it is suitable for plating masks and etching applications, which were previously impossible. 【Features】 ■ Conformability to three-dimensional structures ■ Excellent adhesion ■ High resolution ■ Pinhole-free ■ Chemical resistance *For more details, please refer to the catalog or feel free to contact us.

Our company manufactures and sells electrodeposited resist, but many of our customers are not familiar with photoresist itself. Therefore, we believed there was a need for a basic knowledge page and have created one on photoresist. Some of you may have thought about the following: What exactly is photoresist? I don't really understand the difference between negative and positive types... I can't form a concrete image... If you have such questions, please feel free to download our catalog!! Additionally, we also accept technical inquiries regarding electrodeposited resist, so please contact us through the inquiry form.

Since it is an anionic electrophoretic negative-type photoresist, the developer and stripping solution will be alkaline. The developer and stripping solution are not specialized products.

In the semiconductor manufacturing industry, a precise understanding and application of photoresist is essential for the formation of fine circuits. Particularly, the accuracy of circuit patterns is directly linked to the performance of semiconductor devices, making it important to grasp the characteristics and types of photoresist, as well as their roles in the process. Improper selection or use of photoresist can lead to reduced yield and quality issues with products. This page covers everything from the basic concepts of photoresist to the differences between negative and positive types, process images, coating methods, and the features of our electrodeposition resist, addressing any questions related to photoresist. 【Usage Scenarios】 - Circuit patterning in semiconductor manufacturing processes - Acquisition of basic knowledge about photoresist - Consideration of introducing electrodeposition resist 【Benefits of Introduction】 - Deepening understanding of photoresist - Support for appropriate photoresist selection - Streamlining manufacturing processes and improving quality

In the printed circuit board industry and wiring pattern formation, fine and precise circuit formation is required. In particular, photoresist is an important material for transferring circuit patterns onto substrates, and understanding its characteristics and handling it appropriately directly impacts the quality and reliability of the products. Improper selection or use of photoresist can lead to circuit defects and performance degradation. This page explains the basic knowledge of photoresist and contributes to solving customers' challenges. 【Usage Scenarios】 - I want to learn about the basic mechanism of photoresist. - I want to understand the differences between negative and positive types. - I want to grasp a concrete image of the processes. 【Effects of Introduction】 - Deepen understanding of photoresist. - Help optimize the circuit formation process. - Lead to improved product quality.

In the field of robotics, particularly in the manufacturing of small actuators, precise circuit formation is required. The technology for accurately transferring fine patterns directly impacts the performance and reliability of actuators. Inappropriate selection or use of photoresist can lead to circuit defects and a decrease in product lifespan. Our collection of basic knowledge on photoresist supports optimal material selection and process design by deepening understanding from the fundamentals of photoresist in response to these challenges. 【Application Scenarios】 - Precise circuit pattern formation for small actuators - Micromachining in semiconductor manufacturing processes - Material evaluation during the research and development phase 【Benefits of Implementation】 - Improved accuracy in circuit formation - Maintenance of product reliability and performance - Increased efficiency in the development process

In the field of MEMS, high-precision pattern formation is required for microstructure processing. Particularly, understanding the properties of photoresists and selecting the appropriate ones are crucial for accurately creating fine circuits and structures. The use of inappropriate photoresists or errors in the process can potentially affect the reproducibility of microstructures and the performance of devices. This page explains the basic knowledge of photoresists, their types, process images, coating methods, and the features of our electrostatic resist, contributing to solving challenges in microstructure processing in the MEMS field. 【Application Scenarios】 - Prototyping and development of MEMS devices - Formation of fine circuit patterns - Product development requiring high-precision structural processing 【Benefits of Introduction】 - Acquisition of basic knowledge about photoresists - Promotion of understanding of negative and positive types - Visualization of process images - Understanding of the coating methods for liquid photoresists - Grasping the characteristics of electrostatic resist

In the microelectronics industry, particularly in high-density packaging, there is a demand for technologies that can accurately form fine circuit patterns. Photoresist plays a very important role in this microfabrication process as a photosensitive material that enables pattern formation through exposure. Inappropriate selection or use of photoresist can lead to a decrease in circuit accuracy and the occurrence of defects. Our company has been responding to our customers' advanced needs through the manufacturing and sales of electrodeposited resist. In light of the importance of providing information on the basic knowledge of photoresist, we have created this basic knowledge page. It explains the fundamental mechanisms of photoresist, the differences between negative and positive types, specific process images, and the application methods for liquid photoresist. Additionally, we also introduce the features of our electrodeposited resist, so please feel free to download the catalog. 【Usage Scenarios】 - Fine circuit patterning in semiconductor manufacturing - Manufacturing processes for high-density packaging substrates - Precision processing of electronic components 【Benefits of Implementation】 - Improved accuracy of circuit patterns - Stabilization of manufacturing processes - Enhanced product reliability