ハニー化成 Product Lineup

"Hani Resist AP" is a fine processing positive-type resist electrocoating agent developed based on the electrocoating technology for aluminum building materials (electrocoating resin synthesis technology, electrocoating liquid management technology, electrocoating process technology) that has been cultivated over many years by Honey Kasei and is pioneering in the world. It enables high-speed processing via Reel to Reel for printed circuit boards and COF/TCP (film formation possible in 10 seconds of energization) and allows for fine processing. It also excels in processing capabilities within through-holes, making it easy to form coatings on three-dimensional structures. 【Features】 ■ High-speed processing ■ High resolution ■ Uniform coating thickness ■ Alkaline development, alkaline stripping type *For more details, please refer to the catalog or feel free to contact us.

The "Hani Resist E Series" is a negative-type photoresist electroplating treatment agent developed based on our pioneering electrocoating technology for aluminum building materials (electrocoating resin synthesis technology, electrocoating liquid management technology, electrocoating process technology). Due to its superior adhesion compared to other electrocoating liquids, it is suitable for plating masks and etching applications, which were previously impossible. 【Features】 ■ Conformability to three-dimensional structures ■ Excellent adhesion ■ High resolution ■ Pinhole-free ■ Chemical resistance *For more details, please refer to the catalog or feel free to contact us.

Our company manufactures and sells electrodeposited resist, but many of our customers are not familiar with photoresist itself. Therefore, we believed there was a need for a basic knowledge page and have created one on photoresist. Some of you may have thought about the following: What exactly is photoresist? I don't really understand the difference between negative and positive types... I can't form a concrete image... If you have such questions, please feel free to download our catalog!! Additionally, we also accept technical inquiries regarding electrodeposited resist, so please contact us through the inquiry form.

Since it is an anionic electrophoretic negative-type photoresist, the developer and stripping solution will be alkaline. The developer and stripping solution are not specialized products.

In the semiconductor manufacturing industry, a precise understanding and application of photoresist is essential for the formation of fine circuits. Particularly, the accuracy of circuit patterns is directly linked to the performance of semiconductor devices, making it important to grasp the characteristics and types of photoresist, as well as their roles in the process. Improper selection or use of photoresist can lead to reduced yield and quality issues with products. This page covers everything from the basic concepts of photoresist to the differences between negative and positive types, process images, coating methods, and the features of our electrodeposition resist, addressing any questions related to photoresist. 【Usage Scenarios】 - Circuit patterning in semiconductor manufacturing processes - Acquisition of basic knowledge about photoresist - Consideration of introducing electrodeposition resist 【Benefits of Introduction】 - Deepening understanding of photoresist - Support for appropriate photoresist selection - Streamlining manufacturing processes and improving quality

In the printed circuit board industry and wiring pattern formation, fine and precise circuit formation is required. In particular, photoresist is an important material for transferring circuit patterns onto substrates, and understanding its characteristics and handling it appropriately directly impacts the quality and reliability of the products. Improper selection or use of photoresist can lead to circuit defects and performance degradation. This page explains the basic knowledge of photoresist and contributes to solving customers' challenges. 【Usage Scenarios】 - I want to learn about the basic mechanism of photoresist. - I want to understand the differences between negative and positive types. - I want to grasp a concrete image of the processes. 【Effects of Introduction】 - Deepen understanding of photoresist. - Help optimize the circuit formation process. - Lead to improved product quality.

In the field of robotics, particularly in the manufacturing of small actuators, precise circuit formation is required. The technology for accurately transferring fine patterns directly impacts the performance and reliability of actuators. Inappropriate selection or use of photoresist can lead to circuit defects and a decrease in product lifespan. Our collection of basic knowledge on photoresist supports optimal material selection and process design by deepening understanding from the fundamentals of photoresist in response to these challenges. 【Application Scenarios】 - Precise circuit pattern formation for small actuators - Micromachining in semiconductor manufacturing processes - Material evaluation during the research and development phase 【Benefits of Implementation】 - Improved accuracy in circuit formation - Maintenance of product reliability and performance - Increased efficiency in the development process

In the field of MEMS, high-precision pattern formation is required for microstructure processing. Particularly, understanding the properties of photoresists and selecting the appropriate ones are crucial for accurately creating fine circuits and structures. The use of inappropriate photoresists or errors in the process can potentially affect the reproducibility of microstructures and the performance of devices. This page explains the basic knowledge of photoresists, their types, process images, coating methods, and the features of our electrostatic resist, contributing to solving challenges in microstructure processing in the MEMS field. 【Application Scenarios】 - Prototyping and development of MEMS devices - Formation of fine circuit patterns - Product development requiring high-precision structural processing 【Benefits of Introduction】 - Acquisition of basic knowledge about photoresists - Promotion of understanding of negative and positive types - Visualization of process images - Understanding of the coating methods for liquid photoresists - Grasping the characteristics of electrostatic resist

In the microelectronics industry, particularly in high-density packaging, there is a demand for technologies that can accurately form fine circuit patterns. Photoresist plays a very important role in this microfabrication process as a photosensitive material that enables pattern formation through exposure. Inappropriate selection or use of photoresist can lead to a decrease in circuit accuracy and the occurrence of defects. Our company has been responding to our customers' advanced needs through the manufacturing and sales of electrodeposited resist. In light of the importance of providing information on the basic knowledge of photoresist, we have created this basic knowledge page. It explains the fundamental mechanisms of photoresist, the differences between negative and positive types, specific process images, and the application methods for liquid photoresist. Additionally, we also introduce the features of our electrodeposited resist, so please feel free to download the catalog. 【Usage Scenarios】 - Fine circuit patterning in semiconductor manufacturing - Manufacturing processes for high-density packaging substrates - Precision processing of electronic components 【Benefits of Implementation】 - Improved accuracy of circuit patterns - Stabilization of manufacturing processes - Enhanced product reliability

In the liquid crystal display industry, a proper understanding and utilization of photoresist is essential for accurately forming fine pixel patterns. Particularly in displays where high definition is advancing, the precision of pattern formation directly impacts product quality. Using photoresist without understanding its characteristics can lead to unintended patterns, potentially resulting in display malfunctions. Our company supports the resolution of your technical challenges through the manufacturing and sales of electrodeposited resist. We provide detailed explanations about the basic knowledge of photoresist in our catalog, so please feel free to download it. 【Usage Scenarios】 - Formation of pixel patterns for liquid crystal displays - Formation of fine circuits 【Benefits of Implementation】 - Achievement of high-precision pattern formation - Improvement in the quality of display products

In the LED industry and the formation of light-emitting elements, the creation of fine circuit patterns significantly affects product performance. In particular, the element formation process related to light efficiency and response speed requires precise patterning technology. Inappropriate selection or use of photoresists can lead to reduced yield and failure to achieve the expected performance. This page covers the basics of photoresists, their types, process images, coating methods, and the features of our electrocoated resists, providing information that can help solve technical challenges in LED manufacturing. 【Usage Scenarios】 - Circuit patterning in LED chip manufacturing - Formation of fine light-emitting areas - Processes requiring high-precision pattern transfer 【Benefits of Implementation】 - Acquisition of basic knowledge about photoresists - Promotion of understanding of the LED manufacturing process - Provision of decision-making materials for appropriate photoresist selection

In the manufacturing process of solar cells, high-precision electrode pattern formation is required. In particular, the miniaturization and uniformity of electrodes, which are directly related to light energy conversion efficiency, are crucial factors that influence product performance. Improper pattern formation can lead to a decrease in power generation efficiency and a reduction in product lifespan. Photoresist is an essential material for achieving this precise pattern formation. Our company supports the resolution of your technical challenges through the manufacture and sale of electrodeposition resist. 【Application Scenarios】 - Formation of electrode patterns for solar cells - Manufacturing of electronic components requiring fine processing 【Benefits of Implementation】 - Formation of high-precision electrode patterns - Contribution to improving the power generation efficiency of solar cells - Enhancement of product reliability

In the printing industry’s plate-making process, precise pattern formation is required. Particularly, to accurately reproduce fine circuits and designs, it is important to understand and properly handle the characteristics of photoresist. If the selection and usage of photoresist are inadequate, the accuracy of plate-making may decrease, potentially affecting the quality of the final printed materials. This page comprehensively explains the basic knowledge of photoresist, the differences between negative and positive types, process images, coating methods, and the features of our electrodeposited resist, helping to deepen your understanding in your plate-making operations. 【Usage Scenarios】 - Acquisition of basic knowledge about photoresist in the plate-making process - Understanding of negative and positive photoresists - Confirmation of coating methods for liquid photoresist - Grasping the features of electrodeposited resist 【Effects of Implementation】 - Improvement in the accuracy of the plate-making process - Resolution of questions regarding photoresist - Support for appropriate photoresist selection - Consideration of the use of electrodeposited resist

In the automotive parts industry, the miniaturization and enhancement of sensors and control boards have led to a demand for fine circuit formation technology. In particular, precise pattern formation is essential to ensure the reliability of these components, and the role of photoresist in this process is crucial. If the selection and usage of photoresist are not appropriate, it may lead to circuit defects and a decline in product performance. This page covers basic knowledge about photoresist, its types, process images, coating methods, and the features of our electrodeposition resist, providing information that helps solve customer challenges. 【Usage Scenarios】 - Circuit patterning in semiconductor manufacturing processes - Precise manufacturing of sensors and control boards - Promotion of understanding of fine processing technology 【Benefits of Implementation】 - Acquisition of basic knowledge about photoresist - Improved understanding of the manufacturing process - Support for appropriate photoresist selection

In the field of aerospace high-precision component manufacturing, fine circuit formation and precise processing are required. Particularly, to ensure reliability under extreme conditions, it is important to understand the properties of materials and select appropriate manufacturing processes. Photoresist is a foundational technology for achieving these precise processes, and its fundamental knowledge is essential for improving the quality of high-precision component manufacturing. Our electroplated resist provides products that meet these needs. 【Application Scenarios】 - Manufacturing of electronic components for aerospace - Fine processing of precision equipment parts - Manufacturing of components requiring high reliability 【Benefits of Implementation】 - Improved accuracy of manufacturing processes - Enhanced reliability of components - Support for solving technical challenges

In the micro-machining industry and fine structure processing, high-precision pattern formation is required. In particular, understanding the characteristics of photoresists and their appropriate selection is crucial for precisely creating fine circuits and structures. The use of inappropriate photoresists or errors in the process can lead to a decrease in the accuracy of fine structures and a deterioration in yield. This page covers everything from the basic knowledge of photoresists, their types, process images, coating methods, to the features of our electrodeposition resist, providing information that will help solve technical challenges in micro-machining manufacturing. 【Application Scenarios】 - Design of fine structures for micro-machines - Precision circuit patterning - Semiconductor manufacturing processes - MEMS device manufacturing 【Benefits of Implementation】 - Improvement in the accuracy of fine structure processing - Enhancement of yield - Promotion of understanding of manufacturing processes - Support for appropriate photoresist selection

In the surface processing of optical lenses, precise pattern formation is required. In particular, surface processing that directly affects the functionality and appearance quality of the lens necessitates fine processing accuracy. Inappropriate processing can lead to a decline in lens performance or defects in appearance. This page explains the basic knowledge of photoresists, their types, process images, coating methods, and the features of our electrodeposited resist, contributing to solving challenges in the surface processing of optical lenses. 【Application Scenarios】 - Precise pattern formation for optical lenses - Imparting functionality to lens surfaces - Examination of fine processing technologies 【Effects of Implementation】 - Improvement in processing accuracy - Stabilization of lens quality - Application to new lens designs

In the field of biochips and the formation of microfluidic channels, precise patterning is required. Particularly, the appropriate selection and application of photosensitive materials are crucial for accurately creating fine structures. Inappropriate materials or processes can lead to variations in channel dimensions and functional failures. This page explains the fundamental knowledge of photoresists, which are essential for semiconductor manufacturing, and provides information that can help solve your challenges. 【Use Cases】 - Formation of microfluidic channels in biochips - Situations requiring precise patterning 【Benefits of Implementation】 - Supports the precise formation of microfluidic channels - Contributes to improved product reliability

In the LED manufacturing industry, high-precision formation of light-emitting layer patterns is required. Particularly when forming fine circuits, understanding the characteristics of photoresist and its proper use can significantly impact product performance and yield. Without basic knowledge of photoresist, achieving the desired pattern formation may become difficult. This page covers everything from the basics of photoresist to its types, process images, coating methods, and the features of our electrocoated resist, providing information to deepen the understanding of light-emitting layer pattern formation in LED manufacturing. 【Application Scenarios】 - Formation of LED light-emitting layer patterns - Formation of fine circuits - Semiconductor manufacturing processes 【Benefits of Introduction】 - Acquisition of fundamental knowledge about photoresist - Improved understanding of the pattern formation process - Stabilization of product quality

In the printing (special printing) industry and the field of high-definition printing, the formation of fine patterns and precise image reproduction are required. In particular, surface treatment technologies that affect ink adhesion and resolution are directly linked to the quality of the final product. Inadequate surface treatment can lead to issues such as printing smudges, color unevenness, and reduced resolution. Our company provides foundational knowledge to meet our customers' advanced printing needs through the manufacturing and sales of electrodeposition resist. 【Application Scenarios】 - Printing of high-definition designs - Special printing requiring fine pattern formation - Improvement of ink adhesion 【Benefits of Implementation】 - Improvement of printing quality - Enhancement of resolution - Increase in product added value