IWATA & CO., LTD. Product Lineup

STI Corporation has successfully synthesized and manufactured ultra-high purity silicon carbide (SiC) powder exceeding 99.9999% purity using silica powder (SiO2) and carbon powder (carbon) as raw materials, through processes of uniform powder mixing, high-purity powder sintering, and particle size classification. We will supply ultra-high purity SiC powder for next-generation power semiconductors.

We handle products from SNK Corporation. We offer SiC substrates (such as 6 inches), GaAs, GaN, Ga2O3, Ga2O3 Epi, InP wafers, and other sizes ranging from 2 to 4 inches and other inch sizes as well. Additionally, we support thermal oxide films, SiN, various metal films, and porous silicon processing. 【Product Lineup】 ■ Silicon wafers ■ Various substrates other than silicon wafers ■ Various film deposition processes ■ Various wafer processing *For more details, please download the PDF or feel free to contact us.

Iwata Shokai Co., Ltd. Advanced Materials Division offers a range of materials essential for semiconductor manufacturing processes, including silicon wafers, resists, PTFE/PFA components, equipment, coordination of clean rooms, and research facilities, as well as cleanliness management, catering to customer needs both domestically and internationally. The "clean environment creation" undertaken by this division is in high demand not only in the IT industry but also in the pharmaceutical and food sectors. Particle measurement devices and clean room-related equipment and components are utilized as quality control standards by a wide range of users beyond the semiconductor field. 【Products Offered】 ■ Electronic Grade (EL) Chemicals ■ Materials and Components ■ Various Measuring Instruments ■ Equipment Related ■ Consumables *For more details, please download the PDF or feel free to contact us.

The DC06/21SK is a compact rotary vane pump designed for non-toxic and non-explosive gases. Its volumetric mechanism allows for stable and continuous fluid transport, characterized by very low pulsation (variation in flow rate). This makes it ideal for applications requiring stable vacuum and flow control, such as precision instruments and analytical devices. It achieves excellent vacuum performance of up to approximately 490 mbar and low noise levels (about 62 to 69 dB), contributing to noise reduction when integrated into equipment. Additionally, its space-saving and energy-efficient design with DC drive demonstrates high reliability across a wide range of fields, including industrial equipment and automation systems.