パスカル Product Lineup

The "TOFLAS-3000" is an atomic scattering surface analysis device that can simultaneously perform crystal structure and elemental analysis of solid surfaces such as metals, semiconductors, and insulators. This device has developed the coaxial direct collision ion scattering spectroscopy (CAICISS) method, using an atomic beam of electrically neutral He (Ne, Ar) as a probing tool, allowing for stable surface analysis without the influence of charging, even on insulators. In crystal surface structure analysis, a unique pattern specific to the crystal surface can be obtained through an omnidirectional scan of the incident angle, making it visually easy to determine the surface structure. 【Features】 - Visualization of crystal orientation, symmetry, and the front and back of polar crystals * Easy distinction of the front and back of crystals with wurtzite structures (such as GaN and AlN) - Simple elemental analysis and crystal structure analysis for each layer near the surface * Analysis of ultra-thin films is also possible - When synchronized with pole figure simulation, it can be operated as if "seen in person" - No issues with orientation determination of insulating samples or organic molecular films - High-sensitivity evaluation of impurities through simultaneous measurement with SIMS (complementary to TOF spectra) * For more details, please refer to the PDF document or feel free to contact us. * We also accept analysis requests.

• Analytical Equipment and Devices
• Semiconductor inspection/test equipment

The "Cluster Vacuum Deposition System" consists of an evaluation chamber equipped with an automatic sample transport system, a sample exchange chamber, a sample storage chamber, and a sputtering chamber, as well as analytical instruments for dielectric constant and magnetic measurements, and Hall measurement devices. Additionally, the central automatic sample transport chamber connects to each deposition chamber and the analysis chamber. It automatically transports samples in a vacuum, facilitating the entire process from sample fabrication to evaluation. Furthermore, all chambers can be connected in a high vacuum environment, allowing the system to operate without exposing the samples to the atmosphere from fabrication to evaluation. 【Features】 ■ Composed of an evaluation chamber equipped with analytical instruments ■ Central automatic sample transport chamber - Automates the process from sample fabrication to evaluation, advancing efficiently ■ All chambers - Can be connected in a high vacuum environment - Operates without exposing samples to the atmosphere from fabrication to evaluation *For more details, please refer to the PDF document or feel free to contact us.

• Analytical Equipment and Devices
• Vacuum Equipment
• Evaluation Board

The "TOFLAS-3000" is an atomic scattering surface analysis device that can simultaneously perform crystal structure and elemental analysis of solid surfaces such as metals, semiconductors, and insulators. This device has developed the coaxial direct collision ion scattering spectroscopy (CAICISS) method and uses an atom beam of electrically neutral He (Ne, Ar) as a probing tool, allowing for stable surface analysis without the influence of charging, even on insulators. In crystal surface structure analysis, a unique pattern specific to the crystal surface can be obtained by conducting a full-angle scan of the incident angle, making it visually easy to determine the surface structure. 【Features】 ■ Visualization of crystal orientation, symmetry, and the front and back of polar crystals * Easy distinction of the front and back of crystals with wurtzite structures (such as GaN and AlN) ■ Simple elemental analysis and crystal structure analysis for each layer near the surface * Analysis of ultra-thin films is also possible ■ When synchronized with pole figure simulation, it can be operated as if "seen in person" ■ No issues with orientation determination of insulating samples or organic molecular films ■ High-sensitivity evaluation of impurities through simultaneous measurement with SIMS (complementary to TOF spectra) * For more details, please refer to the PDF document or feel free to contact us. * We also accept analysis requests.

• Analytical Equipment and Devices
• Semiconductor inspection/test equipment

The "PHD-30K-034" is a reflection high-speed electron diffraction system that irradiates a substrate with an accelerated and converged electron beam under ultra-high vacuum for surface characterization. The compact-sized electron gun, mounted on an ICF34 flange, is easy to install and maintain due to its small size. In addition to standard diffraction image observation, it can achieve measurements under high-pressure conditions or sample surface scanning functionality through optional additions. 【Features】 ■ Compact control power supply compatible with 30kV ■ Differential pumping design usable down to 1Pa ■ Monitorable at around 100Pa with a two-stage differential pumping (optional) ■ Electron beam scanning with a scan coil (optional) allows for multiple diffractions under the same conditions *For more details, please refer to the PDF materials or feel free to contact us.

• Other analyses
• Spectroscopic Analysis Equipment

The "PAC-LMBE" is a highly scalable ultra-high vacuum laser MBE (PLD) system. As a substrate heating unit, you can choose between infrared lamp heating and semiconductor laser heating. Six types of targets can be used. Additionally, the load-lock chamber unit allows for easy exchange of targets and substrates in a vacuum. 【Features】 ■ Highly scalable ■ Achievable vacuum level: below 6.7×10^-7Pa (5×10^-9Torr) ■ Six types of targets available ■ Easy exchange of targets and substrates in a vacuum with the load-lock chamber unit ■ Optional ports: various components can be mounted *For more details, please refer to the PDF materials or feel free to contact us.

• Evaporation Equipment

The "MC-LMBE" is a compact ultra-high vacuum laser MBE (PLD) system with high operability. It is equipped with a semiconductor laser substrate heating unit that can heat up to 1200°C. It also has two motor-driven combinatorial masks. Additionally, the load-lock chamber unit allows for easy replacement of targets and substrates in a vacuum. 【Features】 ■ High operability and compact design ■ Achievable vacuum level: 6.7×10^-7Pa (below 5×10^-9Torr) ■ Two motor-driven combinatorial masks ■ Semiconductor laser substrate heating unit capable of heating up to 1200°C ■ Six types of targets available *For more details, please refer to the PDF document or feel free to contact us.

• Evaporation Equipment

This is the comprehensive catalog of Pascal Corporation, which possesses a global perspective in vacuum machinery and equipment, as well as physical and chemical instruments and devices. We constantly focus on the forefront of the times, anticipate new technologies and product needs, and continue to provide products that are beneficial to our users. We offer a lineup that includes the time-of-flight atomic scattering surface analysis device "TOFLAS-3000," which enables the polarity discrimination and structural analysis of insulator surfaces, element identification, and in-situ analysis in electric and magnetic fields—capabilities that were impossible with conventional ion scattering surface analysis devices—as well as "vacuum thin film formation devices" and "surface analysis devices." [Excerpt of Contents] ■ Vacuum devices and components ■ Surface analysis devices ■ Low-temperature related equipment ■ Agilent vacuum equipment (formerly Varian) ■ Other vacuum-related products, etc. *For more details, please refer to the PDF document or feel free to contact us.

• Vacuum Equipment
• Analytical Equipment and Devices
• others

The "TOFLAS-3000" is a time-of-flight atomic scattering surface analysis device that uses an electrically neutral atomic beam instead of ions as the incident probe. By using this product, it is possible to analyze the composition and atomic arrangement of not only semiconductors and metals but also the surfaces of insulators. Additionally, it resolves the issue of charging (charge-up). 【Features】 ■ Demonstrates powerful performance in surface analysis of metals, semiconductors, and insulators ■ Capable of identifying elements on the sample surface ■ Allows for atomic structure analysis of several layers beneath the surface ■ Capable of determining the polarity of the sample surface ■ Supports real-time monitoring of dynamic processes on the surface ■ Measurements can be taken without influence in electric and magnetic fields *For more details, please download the PDF or feel free to contact us.

• Analytical Equipment and Devices
• Semiconductor inspection/test equipment