Chemical

日東電工 東京支店

EstablishmentOctober 25, 1918
capital2670000Ten thousand
number of employees6251
addressTokyo/Minato-ku/26th Floor, Shinagawa Season Terrace, 1-2-70 Konan, Shinagawa-ku
phone03-6632-2101
last updated：
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Cleaning material for wafer adsorption tables "Cleaning Wafer"

A wafer that can easily and reliably collect microscopic foreign substances in contact with the back surface.

Our company handles a wafer-shaped cleaning material called "Cleaning Wafer," which collects foreign substances adhering to the robotic arms and chuck tables of semiconductor manufacturing equipment. By setting the cleaning surface facing down in the wafer cassette and automatically transporting it within the equipment, it can collect minute foreign substances that cause troubles, significantly improving the equipment's operating rate. 【Features】 - Equipped with a cleaning layer that combines foreign substance collection capability and automatic transport on one side of the dummy wafer. - Significant time savings can be expected in resolving troubles caused by foreign substances in the vacuum chamber compared to conventional methods. - Compared to traditional manual cleaning, it is simpler and superior in frequency, accuracy, and responsiveness. *For more details, please download the PDF or contact us.*

  • Other safety and hygiene products
  • Wafer

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