ティー・ケイ・エス List of Products and Services

We will demonstrate our capabilities in the stable production of high-performance optical filters that require multilayering and high reproducibility, such as LiDAR applications, which are expected to see significant demand in the future. - Film formation that eliminates the effects of film quality changes due to target wear using a cylindrical cathode - Stable film formation of oxide films using a reactive ion source - Film formation of a wide range of multilayer films with up to four cathodes This is a device specialized for high-quality optical thin film deposition. Features: ■ Outstanding reproducibility of optical multilayer films ■ Excellent film thickness uniformity ■ Improvement of film quality and defect-free deposition through the combination of cylindrical cathodes and sputter-up ■ Continuous monitoring of the film formation state through in-situ monitoring ■ Fully automated process control *For more details, please refer to the PDF document or feel free to contact us.

Achieving both stable film formation and cost reduction. This is a high-performance, high-quality "Magnetron Sputter Cathode" manufactured by American Angstrom Science. By adopting the patented Shaped Magnet technology, it utilizes a wide area of the target, making it less likely for changes in the sputtering state due to erosion to occur, thus achieving stable film formation and cost reduction for target replacement. 【Features】 ■ Shaped Magnet high-efficiency technology cathode: Achieves high film formation efficiency and stability ■ Reusable targets: Allows for the reuse of your existing targets, reducing costs ■ Balancing stable film formation and cost reduction: Minimal changes in sputtering state due to erosion, reducing target replacement costs ■ Compatible with existing sputtering equipment from various manufacturers: Can be adapted to other companies' equipment ■ High vacuum compatible: Usable in high vacuum environments suitable for a wide range of applications ■ Compatible with target sizes from φ1 inch to φ12 inches: Flexible selection of target sizes ■ Abundant optional features: Various options available, including shutters and tilt angles *For more details, please refer to the PDF document or feel free to contact us.

This is a high-speed ion beam sputtering (IBD) device that excels in the deposition of dielectrics such as Al2O3 and SiO2, which typically have low deposition rates in conventional magnetron sputtering, as well as ferromagnetic materials like Fe. By using a helicon plasma source as the ion source and a groundbreaking method that accelerates the high-density ions obtained from it through the application of bias voltage to the target, it achieves high-rate and highly directional film deposition. It also contributes to cost reduction in deposition processes using valuable and rare targets by efficiently utilizing the entire target surface. <Features> ■ High-speed, high-efficiency ion beam sputtering Optimal solution for dielectric and ferromagnetic targets ■ Helicon plasma ion source and target application Achieving both high-speed sputtering and low contamination Reduction of running costs through improved target utilization efficiency Maintenance reduction due to gridless structure Sputtering while keeping the substrate at low temperature through remote plasma configuration ■ Wafer processing Improved step coverage Composite film deposition using cluster tools ■ Excellent directionality Uniform film thickness can be achieved with a highly directional ion beam, resulting in excellent step coverage in film deposition.