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The "Park NX7" is equipped with all the new technologies developed by Park Systems and is available at an affordable price. This product is designed down to the finest details, just like the higher-end models, and can facilitate research. Additionally, it offers flat orthogonal XY scanning without bowing. Please feel free to contact us if you have any inquiries. 【Features】 ■ Highly expandable AFM solution ■ Flat orthogonal XY scanning without bowing ■ Low noise Z detector ■ Improved chip lifespan, sample preservation, and repeatability through True Non Contact mode * You can download the English version of the catalog. * For more details, please refer to the PDF materials or feel free to contact us.
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Free membership registrationThe "Park NX-HDM" is an atomic force microscope capable of automatic defect inspection and sub-angstrom surface roughness measurement for media and substrates. It is extensively linked with optical inspection devices, significantly improving the throughput of automatic defect inspection. Additionally, it provides accurate sub-angstrom surface roughness measurements even in repeated measurements. 【Features】 ■ Automatic defect inspection for media and substrates ■ Accurate sub-angstrom surface roughness measurement ■ Cost reduction through true non-contact mode ■ Accurate AFM topography with low-noise Z detector *For more details, please refer to the PDF document or feel free to contact us.
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Free membership registrationThe "Park NX-Wafer" is an atomic force microscope that performs defect imaging and analysis fully automatically, improving productivity in defect inspection by 1,000% through AFM measurement techniques. It is a low-noise atomic force profiler for accurate and high-throughput CMP profile measurements. It measures sub-Å surface roughness with extreme accuracy, minimizing variation between chips. 【Features】 ■ Fully automated AFM solution for defect imaging and analysis ■ Up to 1,000% increase in productivity for defect review ■ Achieves accurate and high-throughput CMP measurements with a low-noise atomic force profiler ■ Extremely accurate sub-Å surface roughness measurement, minimizing variation between chip-to-chip ■ Atomic force profiler *For more details, please refer to the PDF document or feel free to contact us.
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Free membership registrationThe "Park NX-3DM" is a fully automated AFM (Atomic Force Microscope) system designed for overhang profiling, high-resolution sidewall imaging, and critical angle measurement. With its patented separated XY and Z scanning system equipped with an inclined Z scanner, it overcomes the challenges of conventional and flare chip methods in accurate sidewall analysis. 【Essential Tool for Wafer Fabrication】 ■ Fully automated industrial AFM using advanced and precise Park NX technology ■ Tilt head design for undercut and overhang structures ■ Accurate sidewall roughness measurement without the need for sample pretreatment ■ High-quality images can be obtained without damaging the device or sample due to the fully non-contact mode (TM) *For more details, please download the PDF or feel free to contact us.
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Free membership registrationThe "Park NX12-Bio" is an atomic force microscope (AFM) equipped with three types of high-performance nanoscale microscopes on a single innovative platform. It enables both innovative liquid imaging with scanning ion conductance microscopy (SICM) and the highly regarded atomic force microscopy (AFM) technology. 【Comprehensive Solution for Nanoscale Biological Research】 ■ Equipped with a fracture-type fully independent Z-axis scanner/XY scanner, featuring high-precision Park NX AFM with complete non-contact technology (TM) ■ Ultra-high-resolution optical imaging using inverted optical microscopy technology ■ Enhanced biological cell imaging through the integration of scanning ion conductance microscopy *For more details, please download the PDF or feel free to contact us.
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Free membership registrationThe "Park NX-Hivac" is a high vacuum atomic force microscope (AFM) designed for failure analysis and materials that are susceptible to environmental influences. It enables precise failure analysis of highly doped semiconductors. Additionally, by utilizing our already recognized technology, it has achieved low noise measurements with high resolution, high reproducibility, and operability. 【High Vacuum Measurement for Failure Analysis】 - Advanced StepScan automatic mechanism and laser alignment mechanism for high-speed scanning - Multi-sample chuck - Park's unique easy chip exchange function - Large vacuum chamber (300mm×420mm×320mm) - Direct optical microscope that enables ultra-long distance observation - Enhanced sensitivity high vacuum SSRM mode *For more details, please download the PDF or feel free to contact us.
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Free membership registrationThe "Park NX20" is a large sample atomic force microscope (AFM) that artistically combines power, versatility, and ease of operation. This product is equipped with unique features to clarify the underlying causes of device failures and develop more creative solutions. Additionally, true non-contact (TM) mode scanning allows chips to be maintained sharper and longer, preventing unnecessary time and cost expenditures. [Solutions using large sample AFM in research and FA labs] ■ Surface roughness measurement for media and substrates ■ Defect inspection imaging and analysis ■ High-resolution electrical property measurement mode ■ Sidewall measurement in 3D structural analysis ■ Accurate AFM shape imaging with a low-noise Z detector *For more details, please download the PDF or feel free to contact us.
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Free membership registrationThe "Park NX10" is an atomic force microscope (AFM) that can be easily operated at all stages, from sample setup to imaging, measurement, and analysis. With this product, users can focus more on innovative research based on better data and more time. 【Features】 ■ Accurate XY scanning without bowing due to crosstalk removal ■ Accurate AFM topography using a low-noise Z detector ■ Top-class chip lifespan, resolution, and sample protection with true non-contact (TM) mode ■ Nano-order surface analysis of various materials such as semiconductors, polymers, battery materials, and carbon-based materials (see image gallery) *For more details, please refer to the PDF document or feel free to contact us.
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