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  2. Electronic Components and Semiconductors
  3. SPUTTERCORE CO.,LTD.
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Electronic Components and Semiconductors
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SPUTTERCORE CO.,LTD.

Establishment25/Dec/2025
capital1000Ten thousand
addressOsaka/Yodogawa-ku, Osaka-shi/Room 707, 2nd Shin-Osaka Building, 6-3-32 Nishi-Nakajima
phone06-6732-9818
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last updated:Nov 10, 2025
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SPUTTERCORE CO.,LTD. List of Products and Services

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金属ターゲット  金属ターゲット 
合金ターゲット 合金ターゲット
セラミックターゲット セラミックターゲット
酸化物ターゲット 酸化物ターゲット
当社の誇る製品 当社の誇る製品
金属ターゲット 

金属ターゲット 

金属ターゲット 

Zirconium (Zr) target

Zirconium (Zr) Target Purity>3N5 Hf<0.2wt% In Shipping...

■Export license: Zirconium (Zr) targets are restricted to export from China and are difficult to obtain, but We are always shipping from the application to the permission law. ■Main characteristics: Warp Zirconium (Zr) target is easy to warp and it is hard to fix the sled. ■Guarantee Including warp inspection GDMS 100% inspection of purity *For more details, please download the PDF or feel free to contact us.

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Hafnium (Hf) target

Hafnium (Hf) target Purity>4N5

■High-purity Hf target Application in the semiconductor industry GDMS with purity measurement values Under the regulatory environment, strictly follow the laws of each country and apply for a license to export ■ Available for civilian use *For more details, please download the PDF or feel free to contact us.

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Tungsten (W) target

Tungsten (W) target Purity>5N

■High purity semiconductor W Target ■Powder metallurgy method for manufacturing ■Various Tungsten alloy target materials *For more details, please download the PDF or feel free to contact us.

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Niobium (Nb) target

Niobium (Nb) target Purity≧3N5

■ Four sides C processing ■ Controllable surface roughness ■ Internal Grain Size can be customized according to customer requirements ■ Configurable Import License ■ Experience in supplying semiconductor companies *For more details, please download the PDF or feel free to contact us.

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Tin (Sn) target

Tin (Sn) target Purity≧4N

■ High purity Purity≧99.99% (4N)  High purity requirements for materials such as semiconductors and optical films ■ Good conductivity Tin (Sn) has excellent conductivity and is suitable for the production of transparent conductive films such as ITO thin films *For more details, please download the PDF or feel free to contact us.

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Tantalum (Ta) Target

Tantalum (Ta) Target Purity>5N

■Tantalum target materials are often used in PVD and CVD coating processes ■High temperature resistance and strong corrosion resistance ■High density Can be used for high-intensity sputtering, with high film deposition efficiency ■Good conductivity *For more details, please download the PDF or feel free to contact us.

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Chromium (Cr) target

Chromium (Cr) target Purity>3N8

■Purity: 2N5-3N8 Manufacturing method: HIP ■ High hardness ■ Strong abrasion resistance *For more details, please download the PDF or feel free to contact us.

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Nickel (Ni) target Purity>4N5

Nickel (Ni) target Purity2N~4N5

■High Purity  Using in the semiconductor industry. ■Density  High density and uniformity ■Nickel alloys are also available  NiCr, NiTi, NiCu, NiCuTi *For more details, please download the PDF or feel free to contact us.

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Titanium Ti Target Purity≧5N5

Titanium Ti Target, Each type purity is possible

■Purity: Each type purity is possible ■Shape: Planner target Rotary target Any abnormal form target ■Titanium alloy target Thin film characteristics such as hardness and conductivity can be adjusted *For more details, please download the PDF or feel free to contact us.

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Copper (Cu) target

Copper (Cu) target Purity: 3 N7~6N Crystal 40-80 um C18200 C18150 Handling

■It is often shipped for semiconductor including touch panel ■Planner target Width 2000 mm, length mm Possible ■Rotary target OD176*ID125*3100mmⅬ  Highest shipment record of 400MT/Y ■We can also produce Backing plate *For more details, please download the PDF or feel free to contact us.

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Iron (Fe) target Sputtering Target Vapor deposition material

Sputtering target Fe; Thin film deposition; Fe target evaporation source; Fe electron beam evaporation Fe; Fe pellet (for evaporation) high purity; Fe target (99.9%, 99.999%)

■ Purity: 99.9% ~ 99.999% ■ Density (16.6 g/cm³) ■ Applications   Thin film formation; superconducting materials; heat and corrosion resistant applications *For more details, please download the PDF or feel free to contact us.

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Tin (Sn) target for semiconductors

Tin (Sn) target purity ≧ 4N

In the semiconductor industry, there is a demand for finer and higher-quality wiring. To enhance the reliability of wiring, the purity and conductivity of materials are crucial. Inappropriate materials or manufacturing processes can lead to wire breakage or performance degradation. Our tin (Sn) target contributes to the high quality of semiconductor wiring due to its high purity and excellent conductivity. 【Application Scenarios】 - Wiring formation in semiconductor manufacturing - Production of ITO thin films 【Benefits of Implementation】 - Improved wiring reliability with high-purity materials - Enhanced performance due to excellent conductivity - Increased yield through uniform film formation

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High Purity Hafnium (Hf) Target for Semiconductors

For semiconductor thin film formation. High-quality thin films with high-purity Hf targets.

In the semiconductor industry, the quality of thin films is becoming increasingly important as devices become more high-performance. In particular, when forming thin films using Hf (hafnium) targets, the purity and uniformity of the target material significantly influence the properties of the thin films. Contamination by impurities and variations in crystal grain size can lead to a decrease in the reliability of the thin films. Our high-purity Hf targets support the formation of high-quality thin films. 【Application Scenarios】 - Thin film formation in semiconductor manufacturing - Production of Hf thin films through sputtering - Manufacturing of high-performance devices 【Benefits of Implementation】 - Achievement of high-quality thin films - Improvement in device performance - Enhancement of yield

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Hafnium (Hf) target for nuclear control rods

Improving the reliability of nuclear control rods with high-purity Hf targets.

In the nuclear power industry, control rods are essential for the safe operation of reactors. The performance of control rods is directly linked to the adjustment of reactor output and safety, which requires high reliability in their constituent materials. Hafnium (Hf) is important as a material for control rods due to its excellent neutron absorption capability. Our high-purity Hf targets achieve high safety and efficiency in the manufacturing of control rods. [Application Scenarios] - Nuclear power plants - Research reactors [Effects of Implementation] - Contributes to the safe operation of reactors - Efficient control due to high neutron absorption capability - Ensures long-term reliability

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Aerospace Hafnium (Hf) Target

High-purity Hf targets to improve heat resistance in the aerospace field.

In the aerospace industry, the durability of materials under high-temperature conditions is crucial. Particularly for rocket and aircraft engine components, heat resistance and stability are required. Hafnium (Hf) targets have been developed to meet these demands. 【Application Scenarios】 - Rocket nozzles - Aircraft engine components - Heat-resistant coatings 【Benefits of Introduction】 - Improved heat resistance - Stability of thin film deposition - Extended product lifespan

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Medical-grade Hafnium (Hf) Target

Support for improving the quality of contrast agents with high-purity Hf targets.

In the medical industry, the quality of contrast agents is directly linked to diagnostic accuracy and is a crucial factor that affects patient health. To maximize the performance of contrast agents, the selection of high-quality materials is essential. Our hafnium (Hf) targets achieve high purity and uniformity, contributing to quality improvement in the manufacturing process of contrast agents. [Application Scenarios] - Contrast agent manufacturing [Effects of Introduction] - Improvement in the quality of contrast agents - Enhancement of diagnostic accuracy

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High Purity Hf Target for Electronic Components

Dielectric films for electronic components. Improved reliability with high-purity Hf targets.

In the electronic components industry, the performance of dielectric films is a crucial factor that affects the reliability of products. Particularly, as miniaturization progresses, the uniformity of thin films, high purity, and absence of internal defects are required. Hf targets contribute to the improvement of electronic component performance by meeting these demands. 【Application Scenarios】 - Formation of dielectric films - Capacitors, memory devices - Thin-film transistors 【Effects of Implementation】 - Improved dielectric properties due to high purity - Stabilization of performance through uniform film thickness - Enhanced reliability by eliminating internal defects

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High Purity Hafnium (Hf) Target for Chemical Catalysts

Supports the optimization of catalytic reactions with high-purity Hf targets.

In the chemical industry, the purity and uniformity of catalyst materials are crucial for enhancing reaction efficiency. In particular, high-purity Hf targets have the potential to improve the selectivity and activity of catalytic reactions. Our high-purity Hf targets achieve stability and reproducibility in catalytic reactions due to their high purity and uniformity. 【Application Scenarios】 - Research and development of catalyst materials - Manufacturing of high-performance catalysts - Optimization of chemical reaction processes 【Benefits of Implementation】 - Improved catalyst performance - Enhanced reaction efficiency - Stabilization of product quality

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Hafnium (Hf) target for display applications

Contributing to the improvement of display quality with high-purity Hf targets.

In the display industry, thin film formation technology significantly influences product performance. In particular, high-quality thin film formation using sputtering technology requires high-purity Hf targets. The purity and uniformity of Hf targets greatly impact the display's visual performance and durability. Our products provide high-purity Hf targets, contributing to the quality enhancement of our customers' display products. 【Usage Scenarios】 - Sputtering process in display manufacturing - Thin Film Transistor (TFT) manufacturing - Touch panel manufacturing 【Effects of Implementation】 - Improved display performance through high-quality thin film formation - Enhanced product durability - Improved yield

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Hafnium (Hf) target for the energy sector

Support for improving energy efficiency in fuel cells and other applications with high-purity Hf targets.

In the energy sector, particularly in areas such as fuel cells, high-quality materials are required to enhance performance and durability. Hafnium (Hf) targets hold the potential to meet these demands. High-purity Hf targets ensure stability and consistency in thin film deposition, contributing to improved performance of fuel cells. 【Application Scenarios】 - Fuel cells - Energy storage devices 【Benefits of Implementation】 - Improved energy efficiency - Increased device longevity

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Hafnium (Hf) target for measuring instruments

Support for improving sensor performance with high-purity Hf targets.

In the measurement equipment industry, particularly in the sensor field, high precision measurements and stable performance are required. The performance of sensors is greatly influenced by the quality of the materials used, with the purity and uniformity of the target materials used for thin film formation being especially important. Contamination by impurities and non-uniformity in film thickness can lead to reduced sensitivity and malfunctions in sensors. Our high-purity Hf targets address these challenges and contribute to the improvement of sensor reliability. 【Application Scenarios】 - High-precision sensors - Environmental measurement equipment - Medical sensors 【Benefits of Implementation】 - Improved sensor performance with high-purity materials - Enhanced stability through uniform thin film formation - Elimination of internal defects through UT inspection

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Hafnium (Hf) target for optical lenses

Support for improving the performance of optical lenses with high-purity Hf targets.

In the optical lens industry, high transmittance and durability are required. Particularly for lenses exposed to ultraviolet light and high-temperature environments, the purity and uniformity of the materials are essential for maintaining lens performance. Inappropriate materials or manufacturing processes can lead to degradation of lens performance and a decrease in lifespan. Our high-purity Hf target contributes to the improvement of optical lens performance due to its high purity and uniformity. 【Application Scenarios】 - Optical lens manufacturing - Coating - Sputtering 【Benefits of Implementation】 - Improved lens transmittance - Enhanced lens durability - Increased stability of film formation

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【For Research Institutions】 Hafnium (Hf) Target

Improve the reliability of experiments with high-purity Hf targets.

In experiments conducted at research institutions, the purity and uniformity of materials significantly impact the results. Particularly in thin film formation experiments, the quality of the target material is crucial, as contamination by impurities or lack of uniformity can compromise the reproducibility of the experiments. Our hafnium (Hf) target achieves high purity and uniformity, contributing to the reliability of experiments. 【Application Scenes】 - Thin film formation experiments - Material property evaluation experiments - Sputtering experiments 【Effects of Introduction】 - Improved reliability of experimental data - Enhanced reproducibility of experiments - Formation of high-quality thin films

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Tungsten (W) target for semiconductors

Improving sputtering efficiency with high-purity tungsten (W) targets.

In the semiconductor industry, sputtering is essential for the formation of high-quality thin films. Particularly as integration increases, the purity and uniformity of the target material become critical factors that influence device performance. Contamination by impurities and variations in film thickness can lead to reduced product yield and reliability issues. Our tungsten (W) targets achieve high purity (≧5N) and improve sputtering efficiency, addressing these challenges. 【Usage Scenarios】 - Thin film formation in semiconductor manufacturing - Manufacturing of high-density devices - Formation of metal films through sputtering 【Benefits of Implementation】 - Improved device performance through high-quality thin film formation - Enhanced yield - Realization of reliable products

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Tungsten (W) target for display applications

Tungsten (W) target purity ≧ 5N

In the display industry, thin film formation technology is a crucial factor that influences product performance and quality. In particular, to enhance the display performance, the formation of uniform and high-quality thin films is essential. The use of inappropriate target materials can degrade the quality of the thin films and negatively impact the brightness and contrast of the display. Our tungsten (W) targets enable the formation of high-purity and uniform thin films, contributing to the high performance of displays. 【Application Scenarios】 - Thin film formation in display manufacturing - High-definition displays, organic EL displays, liquid crystal displays - Thin film formation through sputtering 【Benefits of Implementation】 - Improved display performance through high-quality thin film formation - Uniform film thickness and high adhesion - Increased yield and cost reduction

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Tungsten (W) target for medical devices

Improve the performance of X-ray systems with high-purity tungsten (W) targets.

In the medical device industry, particularly in X-ray systems, high-precision imaging diagnostics are required. The quality of the target material, which serves as the X-ray source, is crucial as it directly affects the clarity of the images and the accuracy of the diagnosis. Contamination by impurities or a lack of uniformity in the target material can degrade the quality of the X-rays and compromise diagnostic accuracy. Our tungsten (W) targets contribute to the performance enhancement of X-ray systems by providing high purity and uniform quality. 【Usage Scenarios】 - X-ray diagnostic equipment - CT scans - Dental X-ray equipment - Industrial X-ray inspection equipment 【Benefits of Implementation】 - Achievement of high-quality X-ray images - Improvement in diagnostic accuracy - Increased longevity of equipment

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Aerospace Tungsten (W) Target

For high-temperature applications in the aerospace field. High-purity tungsten target.

In the aerospace industry, the durability of components under high-temperature conditions is essential. Particularly for heat-resistant components such as rocket engines and aircraft turbine blades, it is crucial to prevent material degradation and maintain performance over extended periods. Improper material selection can lead to component failure or performance deterioration. Our tungsten (W) targets are of high purity and possess excellent heat resistance. The sputtering technology enables uniform film formation, contributing to the manufacturing of heat-resistant components in the aerospace field. 【Application Scenarios】 - Rocket engine nozzles - Coatings for aircraft turbine blades - Heat shields for space exploration vehicles 【Benefits of Implementation】 - Increased lifespan of components in high-temperature environments - Achievement of high heat resistance and durability - Uniform film formation through sputtering

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Tungsten (W) target for automobiles

Tungsten (W) target purity ≧ 5N

In the automotive industry, electrode applications require high durability and reliability. Electrodes must withstand high-temperature environments and heavy loads, and their performance directly affects product quality. Inappropriate electrode materials can lead to performance degradation and failures, potentially shortening the product's lifespan. Our tungsten (W) targets are manufactured with high purity, making them ideal materials for electrode applications. 【Usage Scenarios】 - Electrode manufacturing through sputtering - Electrode components requiring high durability and high reliability 【Benefits of Implementation】 - Improved durability of electrodes - Enhanced product quality - Long-term cost reduction

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Tungsten (W) Target for the Energy Industry

Tungsten (W) target purity ≧ 5N

In the energy industry, especially in applications that require corrosion resistance, the durability of materials is extremely important. Selecting materials that can withstand harsh environments is essential for ensuring the long-term reliability and safety of products. Tungsten (W) targets provide excellent corrosion resistance and contribute to the stable operation of energy-related equipment. 【Application Scenarios】 - Use in corrosive environments - Use in high-temperature environments - Applications requiring high durability 【Benefits of Implementation】 - Prolonged equipment lifespan - Reduced maintenance costs - Stable performance maintenance

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Optical Tungsten (W) Target

Tungsten (W) target purity ≧ 5N

In the optical industry, the quality of reflective materials is a crucial factor that influences optical performance. Particularly in high-precision optical devices and laser systems, uniformity, high purity, and durability of the reflective surface are required. Inappropriate reflective materials can cause light scattering and absorption, potentially leading to a decline in system performance. Our tungsten (W) targets address these challenges and contribute to the enhancement of optical performance. 【Use Cases】 - High-precision optical devices - Laser systems - Reflective mirrors - Optical coatings 【Benefits of Implementation】 - High reflectivity due to high-purity tungsten - Achievement of uniform film thickness and surface roughness - Increased durability leading to longer lifespan - Improvement in optical performance

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[Tungsten (W) Target for Research Institutions]

Improving the reliability of experiments with high-purity tungsten (W) targets.

In experiments conducted at research institutions, obtaining high-precision data is crucial. Particularly in sputtering experiments, the quality of the target material significantly affects the experimental results. Contamination and lack of uniformity can compromise the reliability of the experimental data. Our tungsten (W) targets are of high purity (≧5N), contributing to enhanced reproducibility of experiments. 【Application Scenarios】 - Sputtering experiments - Thin film formation experiments - Material property evaluation 【Benefits of Implementation】 - Acquisition of reliable experimental data with high-purity materials - Improvement of experimental accuracy through uniform film thickness formation - Adaptability to various experiments with W alloy targets

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Tungsten (W) target for electronic components

Tungsten (W) target purity ≧ 5N

In the electronic components industry, the bonding process is a crucial factor that affects product reliability. Particularly for electronic components exposed to high temperatures and vibrations, the quality of the joints significantly influences product lifespan. Poor bonding can lead to decreased performance and early failure of the product. Our tungsten (W) targets achieve high-quality bonding and contribute to the improvement of electronic component reliability. 【Application Scenarios】 - Bonding of semiconductor devices - Bonding of electronic circuit boards - Electrode formation for electronic components 【Benefits of Implementation】 - High-quality bonding with high-purity tungsten - Improved reliability of joints through uniform film formation - Ability to meet diverse bonding needs with W alloy targets

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Tungsten (W) target for metal processing

High-purity tungsten (W) targets that contribute to the efficiency of metal processing.

In the metalworking industry, the durability and precision of tools are crucial factors that influence production efficiency and product quality. Especially for tools exposed to high temperatures and heavy loads, wear resistance and heat resistance of materials are essential. Improper material selection can lead to premature wear or damage of tools, potentially resulting in decreased productivity. Our tungsten (W) targets are of high purity and possess excellent properties, allowing them to perform exceptionally well in tool manufacturing. 【Application Scenarios】 - Tools requiring wear resistance - Tools requiring heat resistance - Tools requiring high precision machining 【Benefits of Implementation】 - Extended tool lifespan - Improved machining accuracy - Enhanced production efficiency

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Tungsten (W) Target for Clock Decoration

For clock decoration. High purity tungsten (W) target.

In the watch industry, both aesthetics and durability are required for decorative applications. Especially in high-end watches, the texture and shine of the materials greatly influence the product's value. If the quality of the decorative parts is low, it can compromise the overall image of the product. Our tungsten (W) target achieves high-quality sputtering deposition and provides the ideal material for watch decoration. 【Usage Scenarios】 - Watch dials - Bezels - Cases - Decorative components 【Benefits of Implementation】 - Achieving a beautiful appearance - High durability - High-quality finish due to uniform deposition - Adaptability to diverse designs

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Tungsten (W) Target for High-End Watches

For watch decoration. High-purity tungsten (W) target with excellent wear resistance.

In the luxury watch industry, the aesthetic appeal of products and the maintenance of long-term quality are crucial. In particular, the durability of materials significantly affects the value of products in areas that are prone to wear from everyday use, such as the watch bezel and case. Using materials that are susceptible to wear can lead to deterioration in appearance and a decline in functionality. Our tungsten (W) target achieves high wear resistance and provides an ideal material for the decoration of luxury watches. 【Application Scenarios】 - Watch dials - Bezels - Cases - Decorative components 【Benefits of Implementation】 - Maintenance of long-term aesthetics due to high wear resistance - High-quality finish achieved through uniform film formation - Compatibility with diverse designs

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Tungsten (W) target for jewelry.

Pursuing the beauty of jewelry. High purity tungsten (W) target.

In the jewelry industry, the aesthetics and durability of products are crucial factors that influence customer satisfaction. Particularly in high-end jewelry, where dense decoration is required, the texture and brilliance of the materials determine the product's value. If the quality of the decorative elements is low, it can undermine the overall image of the product. Our tungsten (W) target achieves high-quality sputtering deposition, providing the ideal material for jewelry decoration. 【Usage Scenarios】 - Watch dials - Bezels - Cases - Decorative components 【Benefits of Implementation】 - Achieving a beautiful appearance - High durability - High-quality finish through uniform deposition - Compatibility with diverse designs

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Tungsten (W) target for precision instruments

For thin film formation of precision machinery. High purity tungsten (W) target.

In the precision machinery industry, the accuracy of thin film technology is becoming increasingly important due to the demand for higher performance and miniaturization of products. Particularly for precision components that require durability and reliability, the formation of high-quality thin films is essential. Low-quality thin films can lead to decreased product performance and shortened lifespan. Our tungsten (W) targets enable high-quality sputtering deposition, providing optimal materials for thin film formation in precision machinery. 【Application Scenarios】 - Sensors - MEMS devices - Optical components - Electronic components 【Benefits of Implementation】 - High-precision thin film formation - High durability - Uniform film thickness - Compatibility with various materials

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Aerospace Tungsten (W) Target

High-purity tungsten (W) targets for aerospace heat-resistant components.

In the aerospace industry, the reliability of components in high-temperature environments is extremely important. Particularly for rocket and aircraft engine parts, heat resistance and durability significantly affect product performance. Low-quality materials can lead to early degradation or malfunction of components. Our tungsten (W) targets enable high-quality sputtering deposition, providing the ideal material for aerospace components that require heat resistance. 【Application Scenarios】 - Rocket engine parts - Aircraft engine parts - Heat-resistant coatings 【Benefits of Implementation】 - Achieving high heat resistance - Excellent durability - High-quality finish through uniform film deposition - Adaptability to diverse designs

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Tantalum (Ta) target for semiconductor thin films

High purity tantalum (Ta) target to improve the quality and efficiency of thin film formation.

In the semiconductor industry, thin films are a crucial factor that influences device performance. Particularly as miniaturization progresses, the uniformity, adhesion, heat resistance, and corrosion resistance of thin films are required. Improper thin film formation can lead to decreased device performance and worsened yield. Our tantalum (Ta) targets enable the formation of high-quality thin films and contribute to the reliability enhancement of semiconductor devices. 【Application Scenarios】 - Thin film formation in PVD/CVD processes - Wiring formation for semiconductor devices - Manufacturing of high-density recording media 【Effects of Implementation】 - Improved thin film uniformity - Enhanced device performance - Improved yield

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Tantalum (Ta) target for implants

Tantalum (Ta) target purity ≧ 5N

In the implant industry, materials with high biocompatibility and durability are required. In particular, stability within the body over a long period and compatibility with bone are important. Inappropriate materials can lead to rejection reactions and early deterioration of the implant. Tantalum (Ta) targets are excellent in biocompatibility and suitable as implant materials. 【Usage Scenarios】 - Coating for implant surfaces - Bone bonding materials - Medical devices 【Effects of Introduction】 - Improved biocompatibility - Enhanced durability - Assurance of long-term stability

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Aerospace Tantalum (Ta) Target

Tantalum (Ta) target purity ≧ 5N

In the aerospace industry, the durability of components in high-temperature environments is crucial. Particularly for rocket and aircraft engine parts, materials with excellent heat resistance and corrosion resistance are required. Traditional materials have faced issues with degradation and corrosion in high-temperature environments. Our tantalum (Ta) target offers high heat resistance and excellent corrosion resistance, enhancing reliability in aerospace applications. 【Application Scenarios】 - Rocket engine parts - Aircraft engine parts - Components used in high-temperature environments 【Benefits of Implementation】 - Improved heat resistance - Enhanced corrosion resistance - Increased lifespan of components

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Tantalum (Ta) target for electronic devices

Improving the performance of capacitors with tantalum (Ta) targets.

In the electronics industry, capacitors play a crucial role in achieving both miniaturization and high performance of products. Particularly for capacitors that require high reliability and long lifespan, the selection of high-quality materials is essential. Tantalum (Ta) targets have been developed to meet these needs. 【Application Scenarios】 - Capacitor manufacturing - Electronic device manufacturing 【Benefits of Implementation】 - Improved capacitor performance - Enhanced product reliability - Increased thin film deposition efficiency

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Tantalum (Ta) Target for the Chemical Industry

Tantalum (Ta) target purity ≧ 5N

In the chemical industry, there is a demand for the protection of components used in highly corrosive environments and for improving the corrosion resistance of reaction vessels. Particularly in environments exposed to strong acids or strong alkalis, material corrosion can lead to product quality deterioration and safety issues. Tantalum (Ta) targets contribute to solving these challenges due to their excellent corrosion resistance. 【Application Scenarios】 - Protection of components in corrosive environments - Improvement of corrosion resistance in reaction vessels - Piping materials in chemical plants 【Benefits of Implementation】 - Increased product lifespan - Enhanced safety - Cost reduction

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Tantalum (Ta) target for the energy sector

Tantalum (Ta) target purity ≧ 5N

In the energy sector, especially in applications under high-temperature environments, the heat resistance and corrosion resistance of materials are extremely important. If the materials cannot withstand high temperatures, it may lead to decreased energy efficiency or, in the worst case, system failure. Tantalum (Ta) targets possess high heat resistance and excellent corrosion resistance, making them ideal for use in high-temperature environments in the energy sector. 【Application Scenarios】 - Thin film formation in high-temperature environments - Manufacturing of components requiring heat and corrosion resistance - Production of devices requiring high energy efficiency 【Benefits of Implementation】 - Stable performance maintenance in high-temperature environments - Increased system longevity - Improved energy efficiency

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Tungsten (W) target for clock parts

For the decoration of watches. High-purity tungsten (W) target.

In the watch component industry, a balance between aesthetics and durability is required. Especially in high-end watches, the texture and shine of the materials greatly influence the product's value. If the quality of the decorative parts is low, it can undermine the overall image of the product. Our tungsten (W) target achieves high-quality sputtering deposition and provides the ideal material for watch decoration. 【Usage Scenarios】 - Watch dials - Bezels - Cases - Decorative parts 【Benefits of Implementation】 - Achieving a beautiful appearance - High durability - High-quality finish through uniform film deposition - Compatibility with diverse designs

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