日本ドナルドソン Product Lineup

The "Risoguard BSMmax Filter" is a cabinet-type chemical filter that exhibits high removal performance against contaminants such as basic and acidic gases, as well as organic gases in the air. It protects wafers and lenses from contamination by various pollutants, maximizing their lifespan. It is ideal for removing airborne contaminants supplied to semiconductor manufacturing equipment, as well as to facilities and areas that require ultra-clean environments. 【Features】 ■ Usable for the removal of various contaminants - Acidic gases (SO2, HCl, HBr) - Basic gases (NH3, NMP, amines) - Condensable organic gases (HMDSO, TMS) ■ Achieves increased adsorption capacity while maintaining the same size compared to conventional activated carbon filters ■ Filters can be reused through the Refill Program ■ A global sales and service network is in place For more details, please contact us or download the catalog.

The "RisoGuard LPS Filter" is a cabinet-type chemical filter that enhances the removal performance of the current class-leading "RisoGuard BSMmax Filter" and achieves further longevity. It protects wafers and lenses from contamination by various pollutants, maximizing their lifespan. It is ideal for removing contaminants from the air supplied to semiconductor manufacturing equipment as well as to facilities and areas that require ultra-clean environments. 【Features】 ■ Usable for the removal of various pollutants - Acidic gases (SO2, HCl, HBr) - Basic gases (NH3, NMP, amines) - Condensable organic gases (HMDSO, TMS) ■ Achieves increased adsorption capacity while maintaining the same size as the RisoGuard BSMmax Filter ■ Can be replaced with the RisoGuard BSMmax Filter ■ Filters can be reused through the Refill Program ■ Global sales and service system For more details, please contact us or download the catalog.

"RisoGuard 12" is a high-efficiency chemical filter system with a HEPA filter developed for high-end semiconductor exposure equipment, including ArF immersion lithography, designed for the removal of acidic, basic, and condensable organic gases. It is equipped with 12 LPS filters or BSMmax filters and 6 HEPA filters within the cabinet. It demonstrates high contaminant removal performance even in low-concentration environments, making it ideal for processes that require a clean environment and for preventing performance degradation due to contamination of optical components. 【Features】 - Long lifespan (equipped with LPS or BSMmax filters) - Space-saving - Low cost (filter recycling through the Refill program) For more details, please download the catalog or contact us.

The "RisoGuard POU (Point-Of-Use/Local) Filter" is a piping-connected type chemical filter designed for the removal of contaminants such as basic, acidic, and organic gases. It captures acidic, basic, and organic gases in the passing gas through physical and chemical adsorption. It is suitable for processes that require the supply of higher purity CDA (Clean Dry Air), inert gases, and compressed air, such as semiconductor manufacturing, various development experiments/evaluation tests, and the protection of laser processing machines and optical devices. 【Main Features】 ■ Usable for the removal of contaminants in compressed air, CDA, N2, and other inert gases ■ The filter main body case is made of stainless steel (SUS304) ■ Captures acidic, basic, and organic gases in the passing gas through physical and chemical adsorption ■ Has high particle removal capabilities in addition to the removal of gaseous contaminants For more details, please refer to the downloadable catalog (English version) or contact us.