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XPump is a cutting-edge AI/ML-based solution that monitors the pump's status in real-time and performs predictive maintenance. It continuously monitors critical parameters such as vibration, temperature, and voltage, providing early warnings to prevent failures. XPump seamlessly integrates with existing systems, improving operational efficiency and reducing downtime and maintenance costs.
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Existing equipment can be equipped with SECS/GEMS functionality! End users: Are there any devices that cannot be equipped with SECS/GEM functionality due to high costs or difficulty in finding compatible vendors? Equipment manufacturers: Wouldn't it be great if you could provide SECS/GEMS functionality without changing existing software or hardware? EIGEMBox solves these problems!! Moreover, there is no need to modify the hardware or software of the equipment!
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This device is compatible with 4, 5, 6, and 8-inch wafers and is designed to form silicon oxide and silicon nitride films on the wafers using the plasma CVD method. The basic configuration consists of three modules: a process module, an RF generator module (one set each for high frequency and low frequency), and a vacuum pump module.
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【Equipment Modification】 ■ Sale of refurbished used equipment ■ Modification for small diameter and compound wafers ■ SMIF to open cassette modification ■ Modification for multiple wafer types (using tray) 【Regular Maintenance】 ■ Chip replacement 【Relocation Services】 ■ In-house relocation ■ Factory relocation 【Troubleshooting】
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The FPA3000 series, which is an i-line stepper, has a proven track record as a standard silicon wafer production machine, and it is highly regarded for its ability to handle the characteristics of compound wafers, such as warping and weight, making it widely supported in that field. Our company is committed to maintaining appropriate inventory levels and has established a demo environment equipped with a developer, microscope, and CDSEM. 【Equipment Modification】 ■ Sale of refurbished used equipment ■ Wafer size change ■ Reticle size change ■ Change of reticle changer type ■ Chamber refrigerant modification 【Parts Sales】 【Parts Repair】 ■ Repair of circuit boards 【Regular Maintenance】 【Relocation Services】 ■ In-house relocation ■ Factory relocation 【Troubleshooting】
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There is a strong demand for mirror projection exposure machines that can perform batch exposure without damaging masks. This machine has contributed to the production of MEMS, such as transistors and power semiconductors, for many years with its compact footprint and low maintenance costs. It continues to tackle challenges related to degradation over time, such as reduced illuminance and deterioration of resolution and uniformity, through unique technologies like mirror regeneration. 【Equipment Modification】 ■ Sale of refurbished used equipment ■ Change of substrate size ■ Chamber refrigerant modification ■ Mirror regeneration 【Parts Sales】 【Pickup Overhaul】 【Regular Maintenance】 【Relocation Services】 ■ In-house relocation ■ Factory relocation 【Troubleshooting】
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ISO/IEC 17025 TAF standards Using manufacturer-certified calibration jigs Rich domestic track record If you are having trouble with failures, repairs, or calibrations, please feel free to consult us!
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【Device Sales】 ■ DAGE4000 ■ DAGE5000 【Specifications】 ■ BS5KG ■ BS250R ■ CBP/TP5KG ■ WP100 ■ WP1KG ■ DS100 ■ Other Load Cells 【Regular Maintenance】 ■ Calibration of Various Load Cells 【Purchase Service】 ■ DAGE4000 ■ DAGE4000plus ■ DAGE4000HS ■ STELLAR4000
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The sensors are highly reliable and are placed directly on the measured wafer, allowing them to provide the actual temperature at the exact location where they are positioned. They can also accurately measure the temperature profile of the wafer and continuously monitor the temperature changes throughout the complete thermal cycle, including transient states such as ramping up, cooling down, and delay periods.
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This is a fully automatic RTP device with a single chamber that supports 4 to 8-inch wafers. The transport method can be selected between open cassette and SMIF, with two cassette stations available. The wafers are stored in a susceptor for processing, achieving excellent Rc and temperature uniformity regardless of wafer characteristics such as warping, thickness, and transmittance. The heat source is a halogen lamp, arranged on both the top and bottom sides. The temperature measurement range is from 20°C to 1250°C. Thermocouples and pyrometers perform real-time temperature measurements, and the results are controlled by a smart PID and multi-zone SCR, enabling superior temperature control. The vacuum chamber is equipped with an oxygen concentration monitor to support the maintenance of an oxygen-free environment. The Windows-based software is multilingual and allows intuitive operation through a graphical user interface. With a track record of over 500 units shipped, we leverage our process profiling expertise and provide assistance in solving challenges in your process development with a demo environment that is always prepared with five units.
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