With a space-saving design, the vacuum pump module can be installed up to 18 meters away from the process module.
This device is compatible with 4, 5, 6, and 8-inch wafers and is designed to form silicon oxide and silicon nitride films on the wafers using the plasma CVD method. The basic configuration consists of three modules: a process module, an RF generator module (one set each for high frequency and low frequency), and a vacuum pump module.
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We offer proposals for semiconductor manufacturing equipment and its components, tailored to customer needs from new to used items. In addition to importing and selling as an authorized distributor for overseas manufacturers, we also provide refurbished products with warranty and after-sales service. Furthermore, we can handle the purchase of excess equipment as well as relocation and removal. Our staff resides in the area, so please consult us for support overseas, particularly in Asia. We leverage our experience to comprehensively support your production operations.
![[Data] Silicon processing data using the non-bosch process](https://image.mono.ipros.com/public/product/image/c8d/2000499800/IPROS02347582528443700539.png?w=280&h=280)
