Fully Automatic RTP (Rapid Thermal Processing) Equipment
Premtek RTP-1200A Series
Premtek RTP-1200A（SEC）（SEF）
This is a fully automatic RTP device with a single chamber that supports 4 to 8-inch wafers. The transport method can be selected between open cassette and SMIF, with two cassette stations available. The wafers are stored in a susceptor for processing, achieving excellent Rc and temperature uniformity regardless of wafer characteristics such as warping, thickness, and transmittance. The heat source is a halogen lamp, arranged on both the top and bottom sides. The temperature measurement range is from 20°C to 1250°C. Thermocouples and pyrometers perform real-time temperature measurements, and the results are controlled by a smart PID and multi-zone SCR, enabling superior temperature control. The vacuum chamber is equipped with an oxygen concentration monitor to support the maintenance of an oxygen-free environment. The Windows-based software is multilingual and allows intuitive operation through a graphical user interface. With a track record of over 500 units shipped, we leverage our process profiling expertise and provide assistance in solving challenges in your process development with a demo environment that is always prepared with five units.
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basic information
【Specifications】 ■ Temperature control range: 200–1250℃ ■ Temperature control method: Multi-PID control ■ In-plane temperature uniformity: ≦±3% (below 600℃), ≦±1.5% (above 600℃) ■ In-plane resistance value uniformity: In-plane resistance value uniformity ■ Vacuum: Yes ■ Wafer size: 6–8 ■ Heating lamp: Tungsten halogen lamp ■ Wafer transport: Fully automatic (5-axis robot) ■ Number of process gas systems: 4 ■ Wafer alignment: Centering, OCR, Aligner (Op) ■ Heating rate: 25℃/second (when using a susceptor) ■ Susceptor: SiC coated carbon ■ Equipment dimensions: D: 1580 W: 1500 H: 1800mm
Price range
Delivery Time
※Ten months (Please feel free to contact us as the delivery time may vary depending on specifications.)
Applications/Examples of results
■ Application - Annealing after implantation - Dopant activation - Metal film contact annealing - Silicide formation (titanium, cobalt, nickel, platinum, etc.) - Source/drain annealing
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Company information
We offer proposals for semiconductor manufacturing equipment and its components, tailored to customer needs from new to used items. In addition to importing and selling as an authorized distributor for overseas manufacturers, we also provide refurbished products with warranty and after-sales service. Furthermore, we can handle the purchase of excess equipment as well as relocation and removal. Our staff resides in the area, so please consult us for support overseas, particularly in Asia. We leverage our experience to comprehensively support your production operations.