ウェーブフロント List of Products and Services

Our company specializes in analysis software for semiconductor-related equipment. We offer a lineup of rarefied fluid analysis software and plasma analysis software, which are actively used in simulations for organic EL and magnetron sputtering. This is for those who are struggling with "wanting to develop new products," "wanting to create and verify actual equipment during product improvements," or "wanting to conduct preliminary verification and comparative verification with equipment." Additionally, since these are in-house developed products, we provide extensive support even after implementation. 【Lineup / Features】 《Rarefied Fluid Analysis Software 'DSMC-Neutrals'》 ■ Supports unstructured meshes, allowing for calculations of complex shapes ■ Capable of simulating gas flow throughout the entire equipment 《Plasma Analysis Software 'Particle-PLUS'》 ■ Capable of low-pressure plasma simulations ■ Useful for research, development, and manufacturing of devices and materials using plasma *For more details, please refer to the materials. Feel free to contact us as well.

"Materials Studio" A suite of molecular modeling/simulation tools for next-generation materials development equipped with quantum mechanics (density functional theory), classical mechanics (molecular dynamics calculations), mesoscale (dissipative particle dynamics calculations, etc.), statistics, and analysis/crystallization tools. 【Features】 ■ Simulation software that streamlines material development Available for use by those engaged in research, development, design, and manufacturing across various industries and fields. ■ Supports various types of materials Effective in predicting how the structure of atoms and molecules relates to the physical properties and behaviors of materials in the fields of materials science and chemistry, aiding in the understanding of physical phenomena. ■ Examples Research and development of crystal growth, thin film formation, fuel cells, lubricants, catalysts, polymers and mixtures, metals and alloys, batteries and fuel cells, etc. ■ Enhanced visualization with "Materials Studio Visualizer" ■ All tasks, including creating crystal structures, setting calculation conditions, and displaying calculation results, can be performed on a single GUI screen. *For more details, please refer to the catalog or feel free to contact us.

VizSpark is an arc plasma simulation software developed by Esgee Technologies in the United States, founded by Professor Raja from the University of Texas at Austin, an expert in plasma simulation. It has the most extensive track record in the analysis of spark plugs and circuit breakers, with many case studies presented at academic conferences. In Japan, it has a strong track record primarily among complete vehicle manufacturers and internal combustion engine-related manufacturers, and it supports the analysis of devices such as: - Circuit breakers - Atmospheric pressure discharge - Ignition plugs (spark plugs) - Plasma torches (plasma jets) - Welding - Thermal spraying - High-intensity lamps

"Materials Studio" A suite of molecular modeling/simulation tools for next-generation material development equipped with quantum mechanics (density functional theory), classical mechanics (molecular dynamics calculations), mesoscale (dissipative particle dynamics calculations, etc.), statistics, and analysis/crystallization tools. 【Features】 ■ Simulation software that streamlines material development Available for use by those engaged in research, development, design, and manufacturing across various industries and fields. ■ Supports various types of materials Predicts how the atomic and molecular structures relate to the physical properties and behaviors of materials in the fields of materials science and chemistry, effectively aiding in the understanding of physical phenomena. ■ Examples Tribochemical (lubrication) reactions Research and development of crystal growth, thin film formation, fuel cells, lubricants, etc. Catalysts, polymers and mixtures, metals and alloys, batteries and fuel cells, etc. ■ Enhanced visualization with "Materials Studio Visualizer" ■ All tasks, including crystal structure creation, calculation condition settings, and calculation result display, can be performed on a single GUI screen. *For more details, please feel free to contact us.

Our company specializes in analysis software for semiconductor-related equipment. We offer a lineup of rarefied fluid analysis software and plasma analysis software, which are effective for simulations of organic EL and magnetron sputtering. We can also accommodate customer needs. 【Product Lineup】 《Rarefied Fluid Analysis Software 'DSMC-Neutrals'》 ■ Supports unstructured meshes, allowing calculations for complex shapes ■ Capable of simulating gas flow throughout the entire equipment 《Plasma Analysis Software 'Particle-PLUS'》 ■ Enables low-pressure plasma simulations ■ Suitable for research, development, and manufacturing of devices and materials using plasma With these two systems, we can support various simulations in semiconductor manufacturing, including thin film generation, sputtering, and plasma etching. *For more details, please refer to the materials. Feel free to contact us with any inquiries.

VizSpark is an arc plasma simulation software developed by Esgee Technologies in the United States, founded by Professor Raja from the University of Texas at Austin, an expert in plasma simulation. It has the most achievements in the analysis of ignition plugs and circuit breakers, with many cases presented at academic conferences. In Japan, it has a strong track record primarily among complete vehicle manufacturers and internal combustion engine-related manufacturers, and it supports the analysis of devices such as: - Circuit breakers - Atmospheric pressure discharge - Ignition plugs (spark plugs) - Plasma torches (plasma jets) - Welding - Thermal spraying - High-intensity lamps

VizGlow is a general-purpose plasma simulation software developed by Esgee Technologies, Inc., founded by Professor Raja from the University of Texas at Austin, an expert in plasma simulation.

**Features** - Adopts unstructured mesh, allowing for calculations that directly reflect the complex shapes of actual devices. - High parallel efficiency enables quick computation results even for large-scale geometries. - Utilizes a particle method, ensuring convergence to a solution even with poor-quality computational grids, unlike fluid models. - Comprehensive technical support ensures that even those new to simulation or busy with experiments can reliably achieve results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film deposition simulations involving chemical reactions like CVD. **Outputs Various Calculation Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions. - Ability to set multiple reaction equations on the GUI. *For more details, please refer to the catalog or feel free to contact us.*

VizSpark is an arc plasma simulation software developed by Esgee Technologies in the United States, founded by Professor Raja from the University of Texas at Austin, an expert in plasma simulation. It has the most achievements in the analysis of ignition plugs and circuit breakers, with many case studies presented at academic conferences. In Japan, it has a significant track record, especially among major automobile manufacturers, and supports the analysis of devices such as: - Circuit breakers - Atmospheric pressure discharge - Ignition plugs (spark plugs) - Plasma torches (plasma jets) - Welding - Thermal spraying - High-intensity lamps

VizSpark is an arc plasma simulation software developed by Esgee Technologies in the United States, founded by Professor Raja, an expert in plasma simulation at the University of Texas at Austin. It has the most extensive track record in the analysis of spark plugs and circuit breakers, with many case studies presented at academic conferences. In Japan, it has a significant track record primarily among complete vehicle manufacturers and internal combustion engine-related manufacturers, and it supports the analysis of devices such as: - Ignition plugs (spark plugs) - Circuit breakers - Atmospheric pressure discharges - Plasma torches (plasma jets) - Welding - Thermal spraying - High-intensity lamps

VizSpark is an arc plasma simulation software developed by Esgee Technologies in the United States, founded by Professor Raja from the University of Texas at Austin, an expert in plasma simulation. It has the most achievements in the analysis of spark plugs and circuit breakers, with many case studies presented at academic conferences. In Japan, it has a strong track record primarily among complete vehicle manufacturers and internal combustion engine-related manufacturers, and it supports the analysis of devices such as: - Ignition plugs (spark plugs) - Circuit breakers - Atmospheric pressure discharge - Plasma torches (plasma jets) - Welding - Thermal spraying - High-intensity lamps

**Features** - By adopting an unstructured mesh, it is possible to calculate the exact shape of complex real devices. - High parallel efficiency allows for quick computation results even for large-scale shapes. - Since it uses a particle method, unlike fluid models, it can achieve a convergent solution even with poor quality computational grids. - With comprehensive technical support, even those new to simulations or busy with experiments can reliably obtain results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film formation simulations involving chemical reactions like CVD. **Outputs Various Computational Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions. - Multiple reaction equations can be set up on the GUI. *For more details, please refer to the catalog or feel free to contact us.*

**Features** - Adopts unstructured mesh, allowing for calculations that accurately reflect the complex shapes of actual devices. - High parallel efficiency enables quick computation results even for large-scale geometries. - Utilizes a particle method, ensuring convergence solutions even with poor-quality computational grids, unlike fluid models. - Comprehensive technical support ensures that even those new to simulations or busy with experiments can reliably achieve results. **Supports Various Cases** - Simulation of rarefied gas flow within a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film deposition simulations involving chemical reactions, such as CVD. **Outputs Various Calculation Results** - Calculations of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculations of dissociation, recombination, and molecular (atomic) exchange reactions. - Ability to set multiple reaction equations on the GUI. *For more details, please refer to the catalog or feel free to contact us.*

【Features】 ■ Adopts unstructured mesh, allowing for calculations that accurately reflect the complex shapes of actual devices. ■ High parallel efficiency enables quick computation results even for large-scale geometries. ■ Utilizes a particle method, ensuring convergence to a solution even with poor quality computational grids, unlike fluid models. ■ Comprehensive technical support ensures that even those new to simulation or busy with experiments can reliably achieve results. ◆ Supports various cases ◆ - Simulation of rarefied gas flow within a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Simulation of thin film generation in semiconductor manufacturing processes such as Chemical Vapor Deposition (CVD), Organic Light Emitting Diodes (OLED), and Molecular Beam Epitaxy (MBE). ◆ Outputs various computation results ◆ - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions. - Ability to set multiple reaction equations on the GUI. * For more details, please refer to the catalog or feel free to contact us.

The dedicated analysis software for arc discharge, "VizSpark," not only considers the characteristics of arc plasma but also takes into account the heat exchange with solids, magnetic fields, and fluid dynamics, making it applicable for a wide range of purposes. It can analyze the heat generated by arc plasma, the pressure and temperature rise associated with heating, as well as the energy efficiency of the arc plasma. 【Features】 ■ Developed by engineers from Esgee Technologies, a company established by experts in plasma simulation in the United States. ■ Allows for accurate verification of arc formation in the development of circuit breakers and relays. ■ Capable of predicting issues caused by overcurrent. ■ By predicting the surface temperature caused by the arc, it can forecast wear on terminals and contacts, as well as terminal melting. ■ Contributes to improving the reliability and safety of electric vehicles and home appliances. *For more details, please refer to the materials. Feel free to contact us with any inquiries.

Simulation Analysis of Dust Behavior Affecting Contamination Initially compatible with various simulations 【Features】 ■ By adopting unstructured meshes, it is possible to compute the exact shape of complex actual devices. ■ High parallel efficiency allows for quick computation results even for large-scale shapes. ■ Since a particle method is used, unlike fluid models, convergence solutions can be obtained even with poor quality computational grids. ■ With comprehensive technical support, even those new to simulations or busy with experiments can reliably achieve results. ◆ Compatible with various cases ◆ - Simulation of rarefied gas flow in a vacuum chamber - Simulation of thin film generation in semiconductor manufacturing - Simulation of thin film generation in semiconductor manufacturing such as Chemical Vapor Deposition (CVD), Organic Light Emitting Diodes (OLED), and Molecular Beam Epitaxy (MBE) ◆ Outputs various computational results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Multiple reaction equations can be set up on the GUI *We also conduct contract analysis, so please feel free to contact us.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - It is capable of advanced physical model analysis such as CCP and external circuit models. - It excels in plasma simulation for low-pressure gases, where fluid modeling is challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analyses, efficiently handling complex models. - As a strength of our in-house developed software, it can perform CCP and magnetron sputtering calculations with standard functions, and customization to fit customer equipment is also possible. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Electron and ion density distribution/temperature distribution/generation distribution - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Neutral gas density distribution/temperature distribution/velocity distribution, etc. *Please feel free to contact us for more details.

"Particle-PLUS" is a simulation software suitable for research and development of devices using plasma, compatible with CCP. - Excels in simulations of low-pressure gases where fluid modeling is challenging. - Advanced physical model analysis including CCP and external circuit models. - Supports 2D and 3D, efficiently analyzing even complex models. - As a strength of our in-house developed software, it not only includes standard functions for CCP and magnetron sputtering calculations but also allows customization to fit customer devices. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us at information@wavefront.co.jp.

"Particle-PLUS" is a simulation software suitable for the research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - It can perform advanced physical model analysis such as CCP and external circuit models. - It excels in plasma simulation for low-pressure gases, where calculations using fluid models are challenging. - It supports both 2D and 3D, allowing for efficient analysis even with complex models. - As a strength of our in-house developed software, it can perform CCP and magnetron sputtering calculations with standard features, and customization to fit customer devices is also possible. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - It can perform advanced physical model analysis such as CCP and external circuit models. - It excels in plasma simulation for low-pressure gases, where calculations with fluid models are challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing efficient analysis of complex models. - As a strength of our in-house developed software, it can perform CCP and magnetron sputtering calculations with standard features, and customization to fit customer devices is also possible. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

Particle-PLUS is a plasma and rarefied fluid analysis software that uses the particle method. It is effective for research, development, and manufacturing of devices and materials using plasma. It is also capable of analyzing advanced physical models such as dual-frequency CCP and external circuit models. With comprehensive support, even those new to simulation or busy with experiments can reliably achieve results. The software employs a particle model to analyze plasma, using the PIC/MC (Particle In Cell / Monte Carlo) method to track the motion of particles representing electrons and ions. Additionally, depending on the target plasma density, it efficiently switches between implicit methods for relatively high densities and explicit methods for low densities, allowing for effective solutions even with complex models. It excels in plasma simulations of low-pressure gases, where fluid modeling is particularly challenging. In addition to standard functions for CCP, ICP, and magnetron sputtering calculations, customization to fit the customer's equipment is also available.

"Materials Studio" A suite of molecular modeling/simulation tools for next-generation materials development equipped with quantum mechanics (density functional theory), classical mechanics (molecular dynamics calculations), mesoscale (dissipative particle dynamics calculations, etc.), statistics, and analysis/crystallization tools. "Materials Informatics" 【Features】 ■ Simulation software that streamlines materials development Available for use by those engaged in research, development, design, and manufacturing across various industries and fields. ■ Supports various types of materials Effective in predicting how the atomic and molecular structures relate to the physical properties and behaviors of materials in the fields of materials science and chemistry, aiding in the understanding of physical phenomena. ■ Examples Research and development of crystal growth, thin film formation, fuel cells, lubricants, catalysts, polymers and mixtures, metals and alloys, batteries and fuel cells, etc. ■ Enhanced visualization with "Materials Studio Visualizer" ■ All tasks including crystal structure creation, calculation condition settings, and calculation result display can be performed on a single GUI screen. *For more details, please refer to the catalog or feel free to contact us.

"Materials Studio" A suite of molecular modeling/simulation tools for next-generation materials development equipped with first-principles calculations, quantum mechanics (density functional theory), classical mechanics (molecular dynamics calculations), mesoscale (dissipative particle dynamics calculations, etc.), statistics, and analysis/crystallization tools. "Materials Informatics" 【Features】 ■ Simulation software that streamlines materials development Available for use by those engaged in research, development, design, and manufacturing across various industries and fields. ■ Supports various types of materials Predicts how the structure of atoms and molecules relates to the physical properties and behaviors of materials in the fields of materials science and chemistry, aiding in the understanding of physical phenomena. ■ Examples Research and development in crystal growth, thin film formation, fuel cells, lubricants, catalysts, polymers and mixtures, metals and alloys, batteries and fuel cells, etc. ■ Enhanced visualization with "Materials Studio Visualizer" ■ All tasks, including crystal structure creation, calculation condition settings, and calculation result display, can be performed on a single GUI screen. *For more details, please refer to the catalog or feel free to contact us.

"Particle-PLUS" is a simulation software suitable for research and development of devices using plasma, compatible with CCP. - Excels in plasma simulation for low-pressure gases where fluid modeling is challenging - Advanced physical model analysis including CCP and external circuit models - Supports 2D (two-dimensional) and 3D (three-dimensional) analysis, efficiently handling complex models - As a strength of our in-house developed software, it offers standard functions for CCP and magnetron sputtering calculations, as well as customization to fit customer devices ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us at information@wavefront.co.jp.

Simulation Analysis of Gas Flow in Showerhead-Type CVD Equipment Initially compatible with various simulations 【Features】 ■ By adopting a non-structured mesh, it is possible to compute the exact shape of complex actual equipment. ■ High parallel efficiency allows for quick computation results even for large-scale shapes. ■ Since a particle method is used, unlike fluid models, convergence solutions can be obtained even with poor quality computational grids. ■ With comprehensive technical support, even those new to simulations or busy with experiments can reliably achieve results. ◆ Compatible with various cases ◆ - Simulation of rarefied gas flow in a vacuum chamber - Simulation of thin film generation in semiconductor manufacturing - Simulation of thin film generation in semiconductor manufacturing such as Chemical Vapor Deposition (CVD), Organic Light Emitting Diodes (OLED), and Molecular Beam Epitaxy (MBE) ◆ Outputs various computation results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Multiple reaction equations can be set up on the GUI *We also offer contract analysis, so please feel free to contact us.

"Particle-PLUS" is software suitable for research and development of devices using plasma, compatible with ICP and CCP. - Excels in simulations of low-pressure gases where fluid modeling is difficult - Calculation functions for inductive heating for ICP simulations - Advanced physical model analysis such as CCP and external circuit models - Capable of simultaneously simulating ICP and CCP - Supports 2D and 3D, efficiently analyzing complex models - As a strength of our in-house developed software, customization to fit customer devices is possible ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us. sales@wavefront.co.jp

"Materials Studio" A suite of molecular modeling/simulation tools for next-generation materials development equipped with quantum mechanics (density functional theory), classical mechanics (molecular dynamics calculations), mesoscale (dissipative particle dynamics calculations, etc.), statistics, and analysis/crystallization tools. 【Features】 ■ Simulation software that streamlines material development Available for use by those engaged in research, development, design, and manufacturing across various industries and fields. ■ Supports various types of materials Effective in predicting how the structure of atoms and molecules relates to the physical properties and behaviors of materials in the fields of materials science and chemistry, aiding in the understanding of physical phenomena. ■ Examples Tribochemical (lubrication) reactions Research and development of crystal growth, thin film formation, fuel cells, lubricants, etc. Catalysts, polymers and mixtures, metals and alloys, batteries and fuel cells, etc. ■ Enhanced visualization with "Materials Studio Visualizer" ■ All tasks, including crystal structure creation, calculation condition settings, and calculation result display, can be performed on a single GUI screen. *For more details, please feel free to contact us.

"Materials Studio" A suite of molecular modeling/simulation tools for next-generation materials development equipped with quantum mechanics (density functional theory), classical mechanics (molecular dynamics calculations), mesoscale (dissipative particle dynamics calculations, etc.), statistics, and analysis/crystallization tools. 【Features】 ■ Simulation software that streamlines materials development Available for use by those engaged in research, development, design, and manufacturing across various industries and fields. ■ Supports various types of materials Effective in predicting how the structure of atoms and molecules relates to the physical properties and behaviors of materials in the fields of materials science and chemistry, aiding in the understanding of physical phenomena. ■ Examples Tribochemical (lubrication) reactions Research and development of crystal growth, thin film formation, fuel cells, lubricants, etc. Catalysts, polymers and mixtures, metals and alloys, batteries and fuel cells, etc. ■ Enhanced visualization with "Materials Studio Visualizer" ■ All tasks, including crystal structure creation, calculation condition settings, and calculation result display, can be performed on a single GUI screen. *For more details, please feel free to contact us.

"Materials Studio" A suite of molecular modeling/simulation tools for next-generation materials development equipped with quantum mechanics (density functional theory), classical mechanics (molecular dynamics calculations), mesoscale (dissipative particle dynamics calculations, etc.), statistics, and analysis/crystallization tools. 【Features】 ■ Simulation software that streamlines materials development Available for use by those engaged in research, development, design, and manufacturing across various industries and fields. ■ Compatible with various types of materials ■ All tasks, including crystal structure creation, calculation condition settings, and calculation result display, can be performed on a single GUI screen. 【Examples】 Tribochemical (lubrication) reactions Analysis of CFRP (carbon-based materials) Research and development of crystal growth, thin film formation, fuel cells, lubricants, etc. Catalysts, polymers and mixtures, metals and alloys, batteries and fuel cells, etc. *For more details, please feel free to contact us.*

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - It can perform advanced physical model analysis such as CCP and external circuit models. - It excels in plasma simulation for low-pressure gases, where calculations with fluid models are challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing efficient analysis of complex models. - As a strength of our in-house developed software, it can perform CCP and magnetron sputtering calculations with standard features, and customization to fit customer devices is also possible. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in plasma analysis within vacuum chambers and can perform simulations of deposition rates at high speeds. - It excels in low-pressure plasma analysis. - It is proficient in plasma simulations of low-pressure gases, where calculations using fluid models are challenging. - It supports both 2D and 3D, allowing for efficient analysis even with complex models. - As a strength of our in-house developed software, customization to fit the customer's equipment is also possible. ◆ Supports various applications ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitive coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It excels in low-pressure plasma analysis. - It specializes in plasma analysis within vacuum chambers, enabling fast simulations of film deposition rates and more. - It is adept at plasma simulations in low-pressure gases, where calculations using fluid models are challenging. - It supports both 2D and 3D, allowing efficient analysis even for complex models. - As a strength of our in-house developed software, customization to fit the customer's equipment is also possible. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitive coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - By combining axisymmetric models and mirror-symmetric boundary conditions, it can quickly obtain results without the need for full device simulations. - It excels in plasma simulations for low-pressure gases, where calculations using fluid models are challenging. - It supports both 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing for efficient analysis of complex models. - As a strength of our in-house developed software, customization to fit the customer's device is also possible. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Electron and ion density distribution/temperature distribution/generation distribution - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Neutral gas density distribution/temperature distribution/velocity distribution, etc. *Please feel free to contact us for more details.

Simulation software 'Materials Studio' useful for new material development By utilizing tools and collaborating, it helps in new material development more efficiently and easily. A next-generation molecular modeling/simulation toolset equipped with quantum mechanics, classical mechanics, mesoscale, statistics, and analysis/crystallization tools. 【Features】 ■ Simulation software that streamlines material development Available for use by those engaged in research, development, design, and manufacturing across various industries. ■ Supports various types of materials. ■ All tasks, including crystal structure creation, calculation condition settings, and calculation result display, can be performed on a single GUI screen. 【Examples】 Tribochemical (lubrication) reactions Analysis of CFRP (carbon-based materials) Crystal growth, thin film formation, fuel cells, lubricants Catalysts, polymers, mixtures, metals and alloys, batteries and fuel cells, etc. "Materials Informatics" "An initiative to explore new materials through information science" In simple terms, the desire to "create amazing materials easily!!" has become a realistic endeavor. *For more details, please feel free to contact us.

By utilizing tools and collaborating, we can contribute to new material development more efficiently and easily. ■ Ideal for "Materials Informatics" This is a group of molecular modeling/simulation tools for next-generation material development equipped with quantum mechanics, classical mechanics, mesoscale, statistics, and analysis/crystallization tools. 【Features】 ■ Simulation software that streamlines material development It can be used by those engaged in research, development, design, and manufacturing across various industries. ■ Supports various types of materials ■ All tasks, including crystal structure creation, calculation condition settings, and calculation result display, can be performed on a single GUI screen. 【Examples】 Tribochemical (lubrication) reactions Analysis of CFRP (carbon-based materials) Crystal growth, thin film formation, fuel cells, lubricants Catalysts, polymers, mixtures, metals and alloys, batteries, and fuel cells, etc. *For more details, please feel free to contact us. Wavefront Inc. Sales Department MAIL: sales@wavefront.co.jp URL: http://www.wavefront.co.jp/

"Particle-PLUS" is a simulation software suitable for the research, development, and manufacturing of devices and materials using plasma. - It excels in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it allows for rapid results without the need for full device simulations. - It specializes in plasma simulations in low-pressure gases, where calculations using fluid models are challenging. - It supports both 2D (two-dimensional) and 3D (three-dimensional) analyses, enabling efficient analysis of complex models. - As a strength of our in-house developed software, customization to fit the customer's device is also possible. ◆ Supports various applications ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitive coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Electron and ion density distribution/temperature distribution/generation distribution - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *Please feel free to contact us for more details.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can quickly obtain results without the need for full device simulations. - It excels in plasma simulations for low-pressure gases, where calculations with fluid models are challenging. - It supports both 2D and 3D, allowing efficient analysis even for complex models. - As a strength of our in-house developed software, customization to fit the customer's equipment is also possible. ◆ Supports various applications ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitive coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can quickly obtain results without the need for full device simulations. - It excels in plasma simulations for low-pressure gases, where calculations using fluid models are challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing for efficient analysis of complex models. - As a strength of our in-house developed software, customization to fit the customer's equipment is also possible. ◆ Supports various applications ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

"Particle-PLUS" is a simulation software suitable for the research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can quickly obtain results without the need for full device simulations. - It excels in plasma simulations for low-pressure gases, where calculations with fluid models are challenging. - It supports both 2D and 3D, allowing for efficient analysis of complex models. - As a strength of our in-house developed software, customization to fit the customer's device is also possible. ◆ Supports various applications ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

"Particle-PLUS" is a simulation software suitable for the research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can quickly obtain results without the need for simulations of the entire device. - It excels in plasma simulations in low-pressure gases, where calculations using fluid models are challenging. - It supports both 2D and 3D, allowing for efficient analysis even with complex models. - As a strength of our in-house developed software, customization to fit the customer's device is also possible. ◆ Supports various applications ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitive coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *Please feel free to contact us for more details.

"Particle-PLUS" is a simulation software suitable for the research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can quickly obtain results without the need for full device simulations. - It excels in plasma simulations in low-pressure gases, where calculations using fluid models are challenging. - It supports both 2D and 3D, allowing for efficient analysis even with complex models. - As a strength of our in-house developed software, customization to fit the customer's equipment is also possible. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

Our company offers contracted analysis (outsourced analysis) and consulting as one of the pillars of our business. Based on the extensive know-how cultivated primarily in thermal fluid analysis of pumps and valves, we provide not just simple analysis proposals using software, but also consultations for contracted analysis (outsourced analysis) services by physics experts.

Our company offers contract analysis (commissioned analysis) and consulting as one of the pillars of our business. Based on the extensive know-how cultivated through contract analysis in CAE, we do not merely propose simple analyses using software; instead, we provide consultations for contract analysis (commissioned analysis) services by experts in physics.

Our company offers contract analysis (outsourced analysis) and consulting as one of the pillars of our business. Based on the extensive know-how gained from contract analysis in CAE, we do not simply propose basic analyses using software; instead, we provide consulting services for contract analysis (outsourced analysis) by physics experts.

Our company offers contract analysis (commissioned analysis) and consulting as one of the pillars of our business. Based on the extensive know-how cultivated through contract analysis in CAE, we do not simply propose basic analyses using software; instead, we provide consultations for contract analysis (commissioned analysis) services conducted by experts in physics.