The conveying system can be used inline with a roller conveyor method!
It is an exposure machine that aligns a glass mask and a workpiece in the photolithography process for glass substrates, and transfers fine mask patterns using soft contact exposure.
Inquire About This Product
basic information
This is an exposure machine used in photolithography processes for glass substrates, where a glass mask is aligned with the workpiece, and fine mask patterns are transferred using soft contact exposure. The transport system can be utilized in-line with a roller conveyor method. *For more details, please download the catalog and contact us.*
Price information
-
Delivery Time
Applications/Examples of results
Exposure field
catalog（1）
Download All Catalogs
Company information
For over half a century, we have continuously refined our technological and product capabilities. By integrating Ushio's unique proposal power with these strengths, we provide solutions that pave the way for the next generation to society and the market. In the business domain of light and industry, where further evolution is anticipated, we will maximize all our capabilities to contribute to the development of our customers and society.
