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  6. Thin film coating compatible with metals, metal oxides, and dielectric films.

Thin film coating compatible with metals, metal oxides, and dielectric films.

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last updated:Nov 12, 2020

フォトプレシジョン
フォトプレシジョン
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Thin film coating compatible with metals, metal oxides, and dielectric films.

Photo Precision Co., Ltd. contributes to prototyping and development in various fields, including microelectronics and optical products, with photofabrication as a core technology. Here is an introduction to our "Thin Film Coating." We can coat most metals and metal oxides! ■□■ Features ■□■ ■ We have in-house resistance heating vacuum deposition, EB heating vacuum deposition, and sputtering equipment. ■ Resistance Heating Vacuum Deposition A deposition method that heats and evaporates thin film materials (targets) in a vacuum and deposits them onto the substrate surface. ■ E.B. Heating Vacuum Deposition A deposition method that heats and evaporates the target in a vacuum and deposits it onto the substrate surface. ■ Sputtering A film formation method where argon positive ions impact the target, and the atoms ejected by the impact arrive at the substrate surface to form a film. ■ Please feel free to inquire about other types of films, film thicknesses, and multilayer films. We can accommodate a wide range of substrate types and sizes.

    Processing Contract
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Thin film coating compatible with metals, metal oxides, and dielectric films.

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thin layer coating.jpg

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Introducing Photoprecision Co., Ltd., which contributes to prototyping and development in various fields, including microelectronics and optical products, with photofabrication as a core technology. We can coat most metals and metal oxides! ■□■ Features ■□■ ■ We have in-house resistance heating vacuum deposition, EB heating vacuum deposition, and sputtering equipment. ■ Resistance heating vacuum deposition A deposition method that heats and evaporates thin film materials (targets) in a vacuum and deposits them onto the substrate surface. ■ E.B. heating vacuum deposition A deposition method that heats and evaporates the target in a vacuum and deposits it onto the substrate surface. ■ Sputtering A film formation method where argon positive ions impact the target, and the atoms ejected by the impact arrive at the substrate surface to form a film. ■ Please feel free to inquire about other types of films, film thicknesses, and multilayer films. We can accommodate a wide range of substrate types and sizes.

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フォトプレシジョン

フォトプレシジョン

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Photo Precision Co., Ltd. is a company that contributes to prototyping and development in various fields, including microelectronics and optical products, with photofabrication as its core technology. Next-generation industrial core products such as MEMS (Micro Electro Mechanical Systems), biochips, and microchemical chips are formed by the complex application of technologies such as nanotechnology, three-dimensional micromachining, high-density three-dimensional packaging, and three-dimensional photolithography. Photofabrication is deeply involved in all of these technologies and serves as the foundational technology for MEMS development. We strive for continuous technical improvement with the support of our customers, while also introducing advanced equipment as much as possible to meet the diverse needs of our clients.

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