Research and development etching device SPE40
【Process】Input → Etching → Liquid Drain → Circulation Water Wash → Direct Water Wash → Squeeze → Extraction 【Substrate Size】Max. W400×L500mm Thickness 0.4〜2.0mm 【Nozzle Swing】Horizontal Swing 【Device Size】W1300×L1590×H1215mm - Space-saving for research use - Ideal for material development and testing - Capable of etching PCBs and LCDs
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basic information
◆ Space-saving etching device compatible with fine patterns due to horizontal oscillation ◆ Can be installed in narrow spaces ◆ User-friendly features and a sleek design ◆ Affordable entry-level model ◆ Short delivery time possible due to standard model ◆ Customization available according to specifications ◆ Compatible with various etching solutions
Price information
4 million to 4.5 million yen (price of the equipment itself)
Price range
P5
Delivery Time
※2.5 to 3 months
Applications/Examples of results
◆Conditions before setting up the mass production line ◆Evaluation and research of materials and chemicals ◆Basic research and development ◆Quality control ◆Small-scale production
Company information
◆Development, etching, stripping devices/cleaning devices for FPC ◆Development, etching, stripping devices/cleaning devices for COF ◆Development, etching, stripping devices/cleaning devices for FPD (TFT/PDP) ◆Cleaning devices for solar cells ◎Fine technology Fine results cannot be reproduced without a comprehensive design that combines nozzle arrangement, nozzle characteristics, oscillation, pressure adjustment, etc. ◎Thin plate transport technology Experience and proven results are essential for transporting thin plates without damage. The Ninomiya system has incorporated creativity and ingenuity to achieve reliable transport. ◎High reliability Devices designed to achieve a higher level can be used with confidence by our customers. The Ninomiya system does not compromise on device manufacturing.
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