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  6. Etching device "MS-3030LWE"

Etching device "MS-3030LWE"

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last updated:Jun 08, 2020

明昌機工
明昌機工
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Formation of localized etching areas! High-precision shape creation through scanning.

The "MS-3030LWE" is a numerically controlled local wet etching device that can create arbitrary shapes by scanning a locally controlled liquid phase etching area with speed control. Since it is a non-contact chemical distortion-free processing method, it is insensitive to disturbances such as vibrations. The processing amount can be accurately controlled with nanometer-order precision based on the etchant's residence time and temperature, allowing for the creation of arbitrary shapes. [Features] - Non-contact processing - Chemical distortion-free processing - Nanometer-order processing precision - Creation of arbitrary shapes through 5-axis NC control *For more details, please refer to the catalog or feel free to contact us.

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エッチング装置『MS-3030LWE』.JPG

Etching device "MS-3030LWE"

エッチング装置『MS-3030LWE』.JPG
エッチング装置『MS-3030LWE』.JPG
  • Related Link - http://www.meisyo.co.jp/02domain1.html

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【Main Specifications】 ■ Equipment Configuration - Main unit (Cleanroom compatible) - Control panel (Cleanroom compatible) ■ Workpieces: Synthetic quartz, Si, SOL wafers, quartz wafers ■ Main Control Unit: 5-axis NC control ■ Table Scroll - X-axis: 350mm - Y-axis: 350mm - Z-axis: 100mm - a-axis: ±25° - b-axis: 12rpm (max), etc. *For more details, please refer to the catalog or feel free to contact us.

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Etching device "MS-3030LWE"

Etching device "MS-3030LWE"

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明昌機工

明昌機工

Manufacturing and processing contract

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Our company utilizes the latest mechatronics technology and strives for continuous improvement in quality to meet customer demands and build trust. Additionally, we engage in ongoing environmental conservation activities to promote sustainable business practices in harmony with the global environment and local communities.

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