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  6. Coating and Developing Equipment ACS200

Coating and Developing Equipment ACS200

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last updated:Feb 25, 2011

ズース・マイクロテック
ズース・マイクロテック
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Fully automatic, compatible with a maximum of 200mm.

By docking our mask aligner module with the full-area exposure method, it can be used as the Ring Graphy Cluster LithoFab200.

    Other processing machines
15.jpg

Coating and Developing Equipment ACS200

15.jpg
15.jpg
  • Related Link - http://www.suss.com/jp/products.html

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【Features】 ■ By docking our mask aligner module with a full-area exposure method, it can be used as a ring lithography cluster LithoFab200. ■ Excellent thick film resist processing capabilities. ■ GYRSET method with a lid rotation coating technology. □ For more details, please refer to the catalog.

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Zuse Microtech Co., Ltd. Product Information (English Version)

Zuse Microtech Co., Ltd. Product Information (English Version)

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SUSS Japan Seminar in 2012_1

The SUSS Japan Seminar in 2012 has concluded.

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On December 4, 2012 (Tuesday), we will hold the SUSS Japan Seminar in 2012 at the Hyatt Regency Tokyo (Shinjuku). This year, we will conduct two seminars in parallel: the Photomask Section "Mask Integrity Challenges – Path to NGL Production" and the 3D Section "Current Status and Trends in 3D Integration Technology." We sincerely invite you to participate. 【Date】December 4, 2012 (Tuesday) 【Location】Hyatt Regency Tokyo, 27F 【General Participation Fee】¥5,000 【Details and Registration Method】http://www.suss.com/jp.html ■ Photomask Section "Mask Integrity Challenges – Path to NGL Production" 【Time】10:00 - 17:10 【Capacity】100 people ■ 3D Section "Current Status and Trends in 3D Integration Technology" 【Time】10:30 - 17:10 【Capacity】100 people ■ Joint Reception 17:15 - 19:00

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ズース・マイクロテック

ズース・マイクロテック

Electronic Components and Semiconductors

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Zeus Microtech is one of the world's leading suppliers of microfabrication equipment, boasting over 70 years of engineering experience in the semiconductor industry and its related markets. We offer a wide range of products and solutions for lithography, wafer bonding, and photomask processing in semiconductor backend processes, as well as associated micro-optics components. Zeus Microtech continues to provide equipment that offers excellent performance/cost-effectiveness, accommodates special specifications, and flexibly adapts to diverse and rapidly changing manufacturing environments in markets such as MEMS, LEDs, advanced packaging, three-dimensional stacking, power semiconductors, and nanotechnology.

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