Fully automatic, compatible with a maximum of 200mm.
By docking our mask aligner module with the full-area exposure method, it can be used as the Ring Graphy Cluster LithoFab200.
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basic information
【Features】 ■ By docking our mask aligner module with a full-area exposure method, it can be used as a ring lithography cluster LithoFab200. ■ Excellent thick film resist processing capabilities. ■ GYRSET method with a lid rotation coating technology. □ For more details, please refer to the catalog.
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Zeus Microtech is one of the world's leading suppliers of microfabrication equipment, boasting over 70 years of engineering experience in the semiconductor industry and its related markets. We offer a wide range of products and solutions for lithography, wafer bonding, and photomask processing in semiconductor backend processes, as well as associated micro-optics components. Zeus Microtech continues to provide equipment that offers excellent performance/cost-effectiveness, accommodates special specifications, and flexibly adapts to diverse and rapidly changing manufacturing environments in markets such as MEMS, LEDs, advanced packaging, three-dimensional stacking, power semiconductors, and nanotechnology.