To MEMS manufacturing sacrificial layers and optical waveguides, etc.
High-speed film formation device for inorganic films. We accept demo experiments and consultations. Please feel free to contact us.
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basic information
【Features】 ○ Film formation on PEN film ○ Film formation speed: up to 1.5μm/min ○ Film formation temperature: 75℃ and above ○ Step coverage: good ○ Type of film: inorganic synthetic film (Formation of SiO₂ film is also possible) ● For more details, please refer to the catalog or contact us.
Price information
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Delivery Time
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Applications/Examples of results
【Usage】 ○ Sacrificial layer for MEMS manufacturing ○ As mask material ○ Protective film of polycarbonate ● For more details, please refer to the catalog or contact us.
catalog（1）
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Company information
KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.