UV/O3 cleaner; UV ozone cleaner
UV-1 is a research and development cleaning device designed to efficiently perform complete dry processing of various semiconductor processes, such as photoresist ashing, silicon wafer cleaning, and chrome mask cleaning, through the interaction of high-concentration ozone and ultraviolet irradiation.
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basic information
【Features】 ○ No vacuum system required due to atmospheric pressure operation ○ Compact design ○ Easy to operate and maintain ○ Low cost ● Please contact us for more functions and details.
Price information
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Delivery Time
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Applications/Examples of results
【Applications】 ○ Photoresist ashing ○ Inkrim-bal ○ Removal of solvent residues ○ Cleaning of chrome masks ○ Cleaning of silicon, compound semiconductors, quartz, liquid crystal displays, lenses, various disks, etc. ● For other functions and details, please contact us.
Company information
We excel in the technology of thin film formation and processing at the nano to micro level, and we are well-regarded for providing equipment and technology for both research and development applications as well as production purposes. Additionally, we specialize in the optoelectronics field, particularly in light sources (LEDs and semiconductor lasers), which are expected to see market expansion in the future.
![[Case Study of Blade Surface Treatment] Thin Film Coating: Swiftly Resolving Blade Adhesion Issues](https://image.mono.ipros.com/public/product/image/ad0/2000608426/IPROS93581875983396727186.jpeg?w=280&h=280)
