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  1. Home
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  3. Manufacturing and processing machinery
  4. Semiconductor Manufacturing Equipment
  5. CVD Equipment
  6. Easy atmospheric pressure SiO2 coating! Plasma coat UL-Colat

Easy atmospheric pressure SiO2 coating! Plasma coat UL-Colat

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ULC

last updated:May 10, 2024

ケー・ブラッシュ商会 本社
ケー・ブラッシュ商会 本社
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Demo available at our company! New technology launched in the market. CVD with atmospheric pressure plasma. Capable of handling small quantities and a variety of products.

The SiO2 film formation using plasma CVD, which has been conducted under reduced pressure until now, can now be performed at atmospheric pressure. The thickness can be controlled depending on the processing conditions (such as speed, liquid volume, distance, etc.). This allows for small-scale production and fine adjustments to conditions that were not feasible with conventional large CVD systems, making it possible to reduce film formation costs. Operation is simple with a touch panel. By saving the condition settings, it is possible to perform film formation under the same conditions in subsequent runs. This is a groundbreaking piece of equipment that is unparalleled in the market using plasma treatment devices. It can be used for a wide range of applications, from mass production to R&D. It is possible to modify wettability through surface treatment with plasma and perform SiO2 coating using the same machine. If plasma coating is not performed, it can also be used as a standard plasma treatment machine for pre-treatment before painting or ink adhesion.

    Other processing machinesCVD EquipmentOther painting machines
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Easy atmospheric pressure SiO2 coating! Plasma coat UL-Colat

ulcoat.png
ulcoat.png
  • Related Link - https://www.kbrasch.co.jp/products_search/category…

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basic information

The device consists of two parts: a standard spot-type plasma treatment device and a coating agent supply unit. It features an all-in-one model with a built-in three-axis robot, and there is also a version that can be operated via a touch panel. It allows for the easy production of SiO2 films, which could only be produced with large vacuum CVD equipment until now, and can be made under atmospheric pressure. We have a demo unit available at our company, and we can create samples within Japan. Additionally, we will collaborate with our headquarters in France to create even more accurate samples.

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Applications/Examples of results

Preprocessing of DLC, low friction properties, improved adhesion through SiO2 layer, water repellency, barrier film by SiO2.

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Company information

ケー・ブラッシュ商会

ケー・ブラッシュ商会 本社

Industrial Machinery

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As a trading company specializing in industrial machinery, we have provided logistics and after-sales services under the motto of "Services that can be trusted by overseas partners and customers," and we have received high praise both domestically and internationally. If you are looking for any equipment or facilities, please feel free to contact us, regardless of whether it is one of our handled products.

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