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  6. Trench Depth Measurement Device IR2100

Trench Depth Measurement Device IR2100

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IR2100

last updated:Jul 17, 2020

日本セミラボ 新横浜本社
日本セミラボ 新横浜本社
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Trench Depth Measurement Device

Non-contact measurement of deep trenches and TSV shapes of power devices, the depth of DRAM capacitor trenches, CD measurements, and recess measurements. High aspect ratio trench measurements are possible with the proprietary technology MBIR (Model Based Infrared). It also supports the measurement of the vertical profile of the doping concentration of epitaxial films.

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Trench Depth Measurement Device IR2100

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2100.png
  • Related Link - http://www.semilab-j.jp/

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basic information

Modulate the broad wavelength band infrared light by guiding it into an interferometer. When the modulated infrared light is irradiated onto the surface of a thin film, the light reflected (multiple times) from the interfaces of the various layers of the thin film causes optical interference. The interference waveform (interferogram) is observed by a detector, and this is Fourier transformed to obtain the reflectance spectrum. This reflectance spectrum, in addition to existing FTIR analysis techniques, utilizes a database of analytical models that can accommodate various measurement applications (film materials and their structures) to simultaneously measure the thickness, trench depth, porosity, doping concentration, TSV shape, recess measurements, etc., of the measurement target (mainly insulating films) within seconds.

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Features - Film thickness measurement throughput: 60 sheets/hour (1 parameter measurement) 5-point measurement (with pattern recognition) - Optical system: Probe spot size: 200x800 μm or 70 μm φ Used infrared light wavelength: 0.9-20 μm (NIR option available) - Load port: FOUP, SMIF, or OC; dual - Mini environment: Class 1000 cleanroom environment compatible with Class 1 - Automation: Compliant with GEM 300, SEMI 300mm, SEMI S2-0200, and CE, etc.

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日本セミラボ

日本セミラボ 新横浜本社

Electronic Components and Semiconductors

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Semilab is a comprehensive measurement device manufacturer that supports research and manufacturing of cutting-edge technologies worldwide. We handle non-contact CV measurement devices, lifetime measurement devices, spectroscopic ellipsometers, photoluminescence, DLTS systems, sheet resistance measurement devices, nanoindenters, AFM, and more for the inspection of semiconductor wafers and devices. Please feel free to contact us for specifications and pricing of our devices.

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