Automatic and manual operation will perform developing, rinsing, washing, and spin drying!
The SD-8004 model is a spin spray development system for 4" to 8" wafers. It performs developing, rinsing, water washing, and spin drying through automatic and manual operation. Condition settings are done via a touch panel on the operation panel. Each processing mode is displayed on the touch panel during the respective mode. For more details, please contact us or refer to the catalog.
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basic information
【Features】 ○ Spin-type spray developing equipment for 4" to 8" wafers ○ Performs developing, rinsing, water washing, and spin drying through automatic and manual operation ○ Condition settings are executed via a touch panel on the operation panel ○ Each processing mode is displayed on the touch panel during operation 【Specifications】 ○ Dimensions: W1490×D1100×H1650 ○ Number of wafers processed: 2 to 8 wafers ○ Liquids used: Developer, rinse solution, pure water ○ Rotation speed: 0 to 1200 rpm ○ Rotating table: φ530 ○ Nozzle arms: 2, with 4 nozzles each ○ Rotation speed display: Digital display ○ Number of programs: 10 programs with 50 steps ○ Included tanks: Developer tank, stirring tank, rinse solution tank ○ Control panel: LCD touch panel ○ Exhaust: 7m³/min ● For more details, please contact us or refer to the catalog.
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Company information
Japan Create has been challenging cutting-edge technologies to respond to the diversification of the semiconductor industry with high precision, labor-saving, and miniaturization. We seek infinite possibilities in high technology and create reliable know-how that matches user needs with our uniqueness. We will continue to strive towards high-level technology.