Equipped with a simple yet φ3-inch target magnetron cathode and a wide-range turbo molecular pump with a capacity of 200 L/s.
● Price: 5 million yen (including tax) ● φ3 inch target, 1 molybdenum cathode ● RF 300W power supply, with automatic matching box ● Gas system: 1 system (up to 3 systems available as an option), adjustable via mass flow controller ● Capable of sputtering insulators such as oxides. ● Option to install a substrate heater available. ● Simple structure that is easy to use while eliminating unnecessary components. ● Space-saving dimensions: 800W × 600L × 900H.
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basic information
Scalability ● Addition of substrate rotation mechanism (can be added later) ● Addition of substrate heating mechanism (can be added later) ● Diversification of sputter sources (must be compatible during chamber fabrication). ● We will accommodate custom designs based on customer requests as much as possible.
Price information
¥5,000,000. - Including tax, without options, does not include primary side equipment such as gas supply and cooling water chillers.
Price range
P5
Delivery Time
※3 months
Applications/Examples of results
● Various experiments at research institutions ● Samples for electron microscopy
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Company information
The necessity of thin film production in next-generation technologies is increasing more and more. In thin film production, there is a demand for technology that is low-temperature, dense, and also highly productive. Our company has made it possible to implement arc discharge measures that were not achievable with conventional opposing target sputtering methods, and we manufacture and sell uniform plasma sputtering devices that meet the above conditions.