Non-contact heavy metal contamination, CV/IV, membrane evaluation device. The sensitivity of iron concentration measurement achieves E8 by adopting DSPV!
This is a non-contact heavy metal contamination, CV/IV, and film evaluation device with over 400 units in operation worldwide. The sensitivity for iron concentration measurement has achieved E8 by adopting DSPV, contributing to the improved yield of recent CMOS image sensors. It is capable of CV measurement of compound semiconductors and can measure the concentration distribution and profile in the plane non-contactly.
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basic information
【Features】 ■ Non-contact CV/IV inline measurement ■ Ultra-high sensitivity contamination management (E8 level iron concentration measurement) ■ Pattern monitor measurement available (SL model) ■ PDM 【Main Measurement and Evaluation Items】 ■ Contamination management - Diffusion length measurement by DSPV - Iron concentration measurement (E8 level) ■ Film evaluation - Electrical film thickness (CET/EOT) - Flat band voltage (VFB) - Interface state density (Dit) measurement - Leak IV measurement - Epi resistivity measurement - High-k evaluation - Low-k evaluation
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■Contamination Management - Diffusion length measurement by DSPV - Iron concentration measurement (E8 level) ■Film Evaluation - Electrical film thickness (CET/EOT) - Flat band voltage (VFB) - Measurement of interface states (Dit) - Leakage IV measurement - Epi resistivity measurement - High-k evaluation - Low-k evaluation
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Dopant Concentration Measurement (NSD) Measurement Data Image
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Semilab is a comprehensive measurement device manufacturer that supports research and manufacturing of cutting-edge technologies worldwide. We handle non-contact CV measurement devices, lifetime measurement devices, spectroscopic ellipsometers, photoluminescence, DLTS systems, sheet resistance measurement devices, nanoindenters, AFM, and more for the inspection of semiconductor wafers and devices. Please feel free to contact us for specifications and pricing of our devices.
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