Measurement device that enables the use of IR reflectance measurement heads! Achieves high-throughput measurement of epitaxial film thickness.
The "EIR-2500" is a unique epitaxial film thickness measurement device equipped with an infrared spectroscopic reflectometer and FTIR functionality. It achieves high-throughput epitaxial film thickness measurements and fully complies with applicable SEMI/CE standards. Additionally, the EIR product series is based on high-performance and reliable electronic components, improving equipment uptime and reducing maintenance needs. 【Features】 ■ Wafer size: 4 to 12 inches ■ Materials: Si, SOI, SiC, SiGe, III-V, etc. ■ FTIR functionality ■ High-precision measurement of epitaxial film thickness ■ Measurement of film thickness in the transition region *For more details, please refer to the related link page or feel free to contact us.
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【Other Features】 ■ Measurement of oxygen concentration and carbon concentration ■ Load port: Single or dual cassette load port ■ High-speed mapping stage ■ IR reflectance measurement head available (for epi film thickness) ■ Additional measurement heads available (spectroscopic ellipsometer, 4PP, etc.) ■ Edge grip (optional) *For more details, please refer to the related links page or feel free to contact us.
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For more details, please refer to the related link page or feel free to contact us.
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Semilab is a comprehensive measurement device manufacturer that supports research and manufacturing of cutting-edge technologies worldwide. We handle non-contact CV measurement devices, lifetime measurement devices, spectroscopic ellipsometers, photoluminescence, DLTS systems, sheet resistance measurement devices, nanoindenters, AFM, and more for the inspection of semiconductor wafers and devices. Please feel free to contact us for specifications and pricing of our devices.
