Three types of targets can be installed! The substrate is automatically transported in a vacuum!
It automatically performs everything from vacuum pumping to substrate transport and sputtering. With its compact design, it is optimal as an experimental device without taking up much space. ~Features~ - The main pump uses a turbo molecular pump. - The sputtering chamber, where the film is deposited, is separated from the chamber where the film is retrieved by a gate valve. After setting the substrate, it is automatically transported in a vacuum. - Up to three types of targets can be installed. - The substrate moves under the targets in the order set, using an automatic rotation mechanism for film deposition.
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basic information
The main pump uses a turbo molecular pump. The film deposition chamber where sputtering is performed is separated from the chamber where the film is retrieved by a gate valve. After setting the substrate, it is automatically transported in a vacuum. Up to three types of targets can be installed. The substrate moves under the targets in the order set by an automatic rotation mechanism and is deposited.
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Applications/Examples of results
Deposition of gold, platinum, and titanium.
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Company information
Our company was founded in 1972 as "Fuji Iron Works," initially focusing on metal processing. In 1999, we changed our name to "Fuji R&D," and gradually expanded our business in response to the ever-changing economic environment. Currently, we provide added value to our customers by consistently manufacturing everything in-house, from the design and assembly to the electrical work of equipment, primarily centered around film deposition devices utilizing vacuum technology. We have a strong track record of delivering to corporate clients and research institutions at universities, and we are grateful for the positive feedback we have received. Moving forward, all of our employees are committed to uncompromising work, and we aim to contribute to society through high-quality products.
