Photo Mask Cleaning Device | Simple Type Mask Cleaning Device TWC-302
TWC-302
"Scrub washing + rinse" & "Hot pure water drying" two-tank simple mask cleaning device
A simple mask cleaning device that removes particles larger than 1μm attached to masks. It is a two-tank mask cleaning device, where scrubbing cleaning with a dedicated brush and rinsing are performed in the first tank, and hot pure water drying is carried out in the second tank. In the scrubbing cleaning of the first layer, cleaning with a dedicated chemical solution is also offered as an option. Using the dedicated chemical solution makes it possible to remove resist residues.
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basic information
■Main Features - Quickly performs 【scrub cleaning, rinsing, and drying】 of workpieces with a single device. - Special brushes for scrub cleaning allow for precise cleaning without scratching the workpieces and without uneven cleaning. - Designed for vertical processing, minimizing stress on the workpieces. - Ideal for small quantities of various types and for R&D applications in substrate cleaning. - Drying is done with hot pure water.
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Applications/Examples of results
Photomask: for semiconductors, for liquid crystals, for organic EL, for thin-film devices, for IC packages, for PWBs, for FPCs, and others, can clean plate-like substrates, etc.
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Company information
Techno Vision Co., Ltd. has been engaged in the development, manufacturing, and import/export of its own products, focusing on cleaning technology and assembly technology since its establishment in September 1987. In today's high-tech industry, we are committed to responding to our customers' needs and providing technology, products, and services from the perspective of our customers.
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