This is a solution that achieves high productivity and ease of use from research and development to mass production, compared to conventional photolithography.
[Features] - Systematization of master molds, soft molds, UV resist, and transfer devices - Resolution of 100 nm - Throughput within 1 to 2 minutes - High aspect ratio (1:5) possible - Residual film thickness below 15 nm
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basic information
【Features】 ○ Simple device configuration without vacuum or pressure ○ Uses a unique material mold with excellent durability ○ Capable of photonic level (φ250nm) ○ Achieves high-speed processing of 120 pieces per hour ○ Realizes a sapphire substrate cross-section selectivity of 0.8 after dry etching ● For more details, please contact us or download the catalog.
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A company that can respond instantly to the rapidly changing information society, that is Kyodo International. It has been 50 years since the company was founded. And a new challenge! We will face difficulties more strongly and boldly than ever. We look forward to your continued support.