Time reduction and cost savings with batch processing! For surface modification of small amounts of powder and tiny components!
The long-awaited compact version of the rotary tabletop plasma device is finally here! Utilizing the high reactivity of plasma for various materials such as "powders and solid surfaces," it can be used for a wide range of surface treatment applications including "hydrophilization," "cleaning," and "adhesion enhancement." Unlike conventional plasma devices that require flipping the sample due to untreated contact areas where the sample does not touch the plasma, this product allows for uniform plasma treatment across the entire sample surface by rotating the chamber. 【Features】 - Equipped with a compact chamber of φ80 - Capable of simultaneous treatment of the entire surface with a rotating chamber - Reduced processing time and cost through simultaneous treatment! - Uniform treatment of contact areas between samples - Easy sample retrieval with a detachable chamber - Mechanism for adjusting rotation speed and applied power 【Applications】 - Enhancing adhesion strength for various resin molded products like O-rings - Uniform surface modification on medical needles and tubes - General applications for improving hydrophilicity and dispersibility of various powders - Enhancing coating adhesion strength on fine particles like capacitors Currently accepting free demo treatments!
Inquire About This Product
basic information
Domestic Manufacturer of Plasma Equipment "Sakai Semiconductor" Established in 2002 as a venture company originating from Kyoto Institute of Technology. Recipient of the "Kansai Front Runner Award" and the "Excellent New Technology/New Product Award for Small and Medium Enterprises." Our in-house engineers respond to various needs. 【Specifications】 - Functions: Power adjustment, rotation speed adjustment, discharge timer Detachable chamber - Output: Approximately 160W; Power supply: AC100V 50/60Hz 15A - Size: Main unit / 440(W) × 353(D) × 340(H) - External dimensions of rotating part: φ80 × H42 - Material of rotating part: PEEK (can be arranged with other materials) 【Options Available】 Our products are made by our engineers from design to manufacturing. Dedicated staff will sincerely respond to various requests from customers. Please feel free to consult us for any other inquiries.
Price range
P5
Delivery Time
※Consultation required.
Applications/Examples of results
【Applications】 - Surface modification of carbon powder used as electrode material for lithium-ion batteries - Hydrophilization of carbon nanotubes - Surface modification of powder for producing water-soluble ink - Hydrophilic treatment of SiO2 powder, etc... We also offer free demo processing for condition setting and paid rentals, so please feel free to contact us if you have any concerns regarding your applications!
Detailed information
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Enlarged view of the chamber section Equipped with a small rotating chamber φ80! Removable for smooth operation.
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Company information
KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.
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