We are publishing the specifications of various grid ion sources manufactured by Kaufman & Robinson.
At OSI Industry, we handle various grid ion sources manufactured by Kaufman & Robinson. We have detailed specifications for each type of grid ion source, so please take this opportunity to have a look. 【Contents Listed】 ● Discharge / Discharge Current / Discharge Power ● Grid ● Beam Type ● Gas Flow Rate ● Gas ● Pressure ● Ion Gun Height / Ion Gun Diameter ● Neutralizer For more details, please download the catalog or contact us.
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basic information
【Grid Ion Source Lineup】 ●RFOCP40 ●RFICP100 ●RFICP140 ●RFICP200 ●KDC10 ●KDC40 ●KDC75 ●KDC100 ●KDC160 For more details, please download the catalog or contact us.
Price information
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Applications/Examples of results
For more details, please download the catalog or contact us.
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Company information
Our company started in 1988 as an overseas export trading company for vacuum thin film manufacturing equipment, and has expanded its operations as a "total planner of vacuum technology" up to the present day. During this time, we have focused on the development of optical thin film materials, as well as the sales of ion beam processes and refrigeration units (Sapcold). Additionally, we have developed and are set to launch the GCIB (Gas Cluster Ion Beam) process equipment, which is expected to be an important technology in the next generation of nano-processing. Starting with glasses and camera lenses, we now see new media continuously emerging in the optical-related industry, including digital cameras, mobile phones, and medical lenses.
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