Tracking evaluation of phase transitions and crystallinity changes during the heating process.
For the sample where Pt was sputter-deposited on a Si substrate, Out-of-plane XRD and In-plane XRD measurements were conducted while increasing the temperature. In both measurements, it was observed that the peak intensity of Pt(111) increased and the full width at half maximum decreased at temperatures above 500°C, indicating that crystallization was progressing. Additionally, it was confirmed that as the temperature rose, thermal expansion caused the peaks to shift towards lower angles (the direction of increased lattice spacing).
Inquire About This Product
basic information
For detailed data, please refer to the catalog.
Price information
-
Delivery Time
Applications/Examples of results
Analysis of solar cells, oxide semiconductors, LSI, and memory.
catalog（1）
Download All Catalogs![[Analysis Case] Evaluation of Metal Films by High-Temperature XRD_C0270](https://image.mono.ipros.com/public/catalog/image/01/896/334779/IPROS17420989001213370696.jpg?w=120&h=170)
Company information
MST is a foundation that provides contract analysis services. We possess various analytical instruments such as TEM, SIMS, and XRD to meet your analysis needs. Our knowledgeable sales representatives will propose appropriate analysis plans. We are also available for consultations at your company, of course. We have obtained ISO 9001 and ISO 27001 certifications. Please feel free to consult us for product development, identifying causes of defects, and patent investigations! MST will guide you to solutions for your "troubles"!