A tool that enables high-speed, high-sensitivity, and large-area macro observation, which has been difficult until now!
The "ARCscan Type RE & ME compatible" is a device that enables the analysis and evaluation of pattern shape uniformity over a wide area, which is difficult to observe at the microscopic level. It achieves optimal optical conditions for the observation target, making high-sensitivity, high-speed, and large-area inspections possible, which were previously challenging. It features a dual specification with "Type: RE," which allows macro observation under optimal conditions for patterns, and "Type: ME," which enables nano evaluation using a macro optical system. 【Features】 ■ Achieves optimal optical conditions for the observation target ■ Enables high-sensitivity, high-speed, and large-area inspections that were previously difficult *For more details, please refer to the catalog or feel free to contact us.
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【Features】 (Type: RE) ■ High-speed macro inspection of large area pattern uniformity → Nanoimprint molds, light guide plates, diffusion plates, lens arrays ■ Edge detection with high correlation to pattern shape using edge reflection macro optical technology (Type: ME) ■ Evaluation of nanoscale features using macro optical systems → Macro appearance inspection of silicon, SiC, and compound wafers ■ Detection of changes in pattern groups below 10nm using off-axis optical systems *For more details, please refer to the catalog or feel free to contact us.
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For more details, please refer to the catalog or feel free to contact us.
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Smix Corporation is a company specializing in the development, manufacturing, and sales of devices for macro optical inspection. We can perform macro inspections that have a high correlation with CD, capture size variations of 3nm on a macro scale, and visualize the unevenness of mirror-like wafers. By implementing our macro inspection, customers can establish a more efficient and cost-competitive inspection process. Trust us with your macro optical inspection needs.