High-precision contact pressure control! Simple optical nanoimprint experiments are also possible.
The micro contact printer "PA400S" is a micro contact printing device that supports the mCP (micro contact printing) method, which is gaining attention as a next-generation device fabrication technique, as well as a simplified optical nanoimprint (UV-NIL) method. The mCP method fabricates organic electronics and bio-microstructures that have rapidly developed through the transfer of thiol ink using PDMS stamps. The UV-NIL method produces ultra-fine microdevices using quartz molds and photo-curable resins. Two independent stations for ink replenishment and the printing process allow for programmable control of contact speed, contact pressure, distance, and time using high-precision pressure sensors and Z-axis servo control. Additionally, it can also be used as a mask aligner, providing flexible support for various experiments and production. 【Features】 ■ Programmable control of contact speed and contact pressure ■ Programmable control of distance and time ■ Can be used as a mask aligner, among others *For more details, please refer to the catalog or feel free to contact us.
Inquire About This Product
basic information
【Specifications】 ■ Print Format - W-station method - (Print/Exposure station and Ink refill station) ■ Alignment Mechanism - XYZO¢ (parallel) axis, Z-axis motor drive resolution 0.1 pm - Two stations with the same specifications ■ Z-axis Motion Control - Speed, acceleration, contact pressure, height, time - Program control (auto block) and jog operation ■ Contact Pressure Range: 1–100 N (theoretical resolution 1 N) ■ Applicable Samples - Maximum size □ 4 inches ■ Applicable Stamps - Compatible masks when using mask aligner - Maximum size □ 5 inches, thickness 0.06 or 0.09 inches ■ Applicable Stamp Base - Maximum size □ 4 inches ■ Exposure Method - 1:1 magnification exposure contact (contact pressure adjustable) and proximity ■ Exposure Performance (Standard) - Collimator lens method 250W φ80mm uniformity ±15% - 6 mW/cm² at 365 nm (upgradable) ■ Alignment Method - Visual alignment using dual-objective CCD & monitor observation microscope *For more details, please refer to the catalog or feel free to contact us.
Price information
Please contact us.
Delivery Time
※Please contact us.
Applications/Examples of results
For more details, please refer to the catalog or feel free to contact us.
catalog（1）
Download All Catalogs
Company information
For inquiries regarding MEMS micromachine-related development tools, please contact us.
