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  6. Vacuum Plasma Irradiation Device

Vacuum Plasma Irradiation Device

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last updated:Jun 13, 2017

エステック
エステック
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Gentle surface modification for the interface with cells! Control of the density of hydrophilic and hydrophobic groups.

The "Vacuum Plasma Irradiation Device" is a device that gently modifies the surface in contact with cells to be cell-friendly. It can freely modify the resin surface to be either hydrophilic or hydrophobic, allowing for processing under optimal conditions. We find the most suitable plasma irradiation conditions for various materials. We also accept contract processing. 【Features】 ■ Powerful and uniform irradiation with no processing unevenness ■ Minimal etching effect, resulting in almost no physical damage to materials ■ High-density functional groups can be generated, enabling direct bonding without adhesives ■ Extremely low regression of functional groups ■ Extremely low gas consumption *For more details, please refer to the PDF document or feel free to contact us.

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Vacuum Plasma Irradiation Device

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  • Related Link - http://www.stc-jp.co.jp/index.html

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【Other Features】 - Quick plasma irradiation even with small samples - Ability to observe internal conditions and small changes during plasma irradiation - Free setting and adjustment of irradiation conditions such as vacuum level, gas flow rate, and plasma voltage - Discovering optimal plasma irradiation conditions and building our unique know-how *For more details, please refer to the PDF document or feel free to contact us.

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エステック

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We are a mechatronics manufacturer that quickly creates products tailored to our customers' needs, working together with them. With a consistent system encompassing planning, design, manufacturing, assembly, installation, and maintenance, our entire team strives daily. Please feel free to consult with us.

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