A small sputtering device for research and development that allows for the exchange of substrates and targets in an inert gas atmosphere.
The "SSP2500G Sputtering Device with Glove Box" is a compact sputtering device designed for research and development that achieves high quality at a low price, allowing for substrate and target exchanges in an inert gas atmosphere. Despite its small size, it is equipped with two 2-inch cards and can change the distance between target substrates without breaking the vacuum, enabling substrate rotation and film deposition while heating. Additionally, the front hatch and substrate chucking mechanism allow for easy substrate exchange. A simple glove box with a vacuum-replaceable pass box is directly connected to the front hatch of the sputtering chamber, enabling substrate and target exchanges without exposing them to the atmosphere. *For more details, please download the PDF or feel free to contact us.*
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basic information
【Performance】 ■Vacuum Performance Achievable Pressure: ≦9×10^-5Pa ■Film Formation Performance Film Thickness Distribution: φ100mm area ≦±5% (Rotational Film Formation) *For more details, please download the PDF or feel free to contact us.
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For more details, please download the PDF or feel free to contact us.
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Sugano Manufacturing Co., Ltd. specializes in vacuum technology and high-temperature technology as core technologies, and sells research and development support equipment that can assist in device development, material development, and other research and development fields. Additionally, we provide marine equipment centered around clutch systems for auxiliary machinery, as well as writing services for general-purpose microcontrollers and general-purpose memory. We support our customers' diverse needs with high technical capabilities.
