Achieving resolution beyond the diffraction limit! An exposure system that can create periodic structures at low cost.
The "PhableR 100" is a low-cost exposure system capable of producing high-resolution periodic structures. Photoresist is coated, and a mask is set in proximity for exposure. Thanks to unique technology, it achieves resolution beyond the diffraction limit. It can create sub-micron scale gratings and 2D patterns in hexagonal and triangular arrangements. 【Features】 ■ High resolution with a pitch of 300nm or less ■ Achieves a pitch of 150nm with DUV light source selection ■ Full-area exposure ■ Non-contact: protects the mask from damage and contamination ■ Virtually unlimited depth direction focus *For more details, please refer to the PDF document or feel free to contact us.
Inquire About This Product
basic information
【Other Features】 ■ Suitable for non-flat substrates (e.g., epi-wafers) ■ High uniformity ■ Overlay alignment capability ■ Common photoresists and materials are available ■ Conventional masks can be used (chrome on glass) ■ Achieves patterning with up to twice the resolution compared to the mask *For more details, please refer to the PDF document or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
For more details, please refer to the PDF document or feel free to contact us.
catalog（1）
Download All Catalogs
Company information
A company that can respond instantly to the rapidly changing information society, that is Kyodo International. It has been 50 years since the company was founded. And a new challenge! We will face difficulties more strongly and boldly than ever. We look forward to your continued support.
![[Patent] Achieving an air nozzle that completely removes water with air blow.](https://image.mono.ipros.com/public/product/image/2116982/IPROS16998950562973190030.png?w=280&h=280)
