EQ-10 equipped with EUV light source, extreme ultraviolet light compatible analysis exposure device.
The EUV exposure device EUVES-7000 for resist analysis is equipped with the EQ-10 EUV light source manufactured by Energetiq Technology in the United States, enabling open-frame exposure compatible with extreme ultraviolet light at a wavelength of 13.5 nm.
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basic information
【Main Features】 ●Equipped with Energetiq Technology's EQ-10 EUV Source ●Capable of EUV (13.5nm) exposure For more details, please contact us.
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Company information
Riso Tech Japan, since its establishment, has been a specialist in lithography, providing not only resist exposure/development analysis equipment, resist coaters/developers, and lithography simulators, but also evaluation of exposure/development materials for cutting-edge lithography processes. In particular, for resist processing equipment, we propose optimal specifications tailored to customer needs, adapting spin coaters, developers, bake (PEB) equipment, and film thickness measurement to various fields, ranging from development experimental equipment to fully automated production systems. For example, we offer coating equipment for various substrates such as ultra-thin silicon wafers, various compound semiconductors, quartz, sapphire, and piezoelectric substrates (SAW), including ArF resist, EB resist, high-viscosity thick-film resist, polyimide, insulating films, and wax, as well as development equipment for alkaline, inorganic, and organic materials. Additionally, we provide various process units such as HMDS treatment, vacuum bake, UV irradiation, and high-temperature bake processing.
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