A cost-effective version of a user-friendly vacuum plasma device! For Teflon hydrophilization and water repellency of various materials.
A new lineup of the user-friendly tabletop vacuum plasma device "Plasma Etcher" series has been introduced, featuring a semi-automatic type! It has been further miniaturized and can be installed in a space-saving manner. It is now even easier to use with both automatic and manual functions. Manual operation can be performed via a touch panel, and you can also set recipes in advance for one-button easy operation. The stage size can be freely selected from φ100mm to φ1000mm. In addition to general hydrophilization and adhesion enhancement of ceramics, metals, and resins, it can also be used for processing PTFE (Teflon), water-repellent treatment of various materials, etching, and thin film formation. Custom orders for options such as cooling mechanisms and additional gas systems are also accepted.
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basic information
- Specifications Model: CPE-300S External Dimensions: 680(W) × 785(D) × 1020(H) Chamber Dimensions: Φ300mm, H30mm *Changeable with options Weight: 80kg Power Output: 300W (13.56MHz) Gas System: 1 system *Multiple systems available as an option Gas Control: Mass Flow Controller Power Supply: 100V, 15A (50Hz/60Hz)
Price information
The price varies depending on the specifications, so please feel free to contact us.
Price range
P6
Delivery Time
※3 months
Applications/Examples of results
【Surface Modification】 - Surface modification / Dry cleaning / Improvement of hydrophilicity / Enhancement of adhesion effects / Pre-treatment for printing and painting / Removal of organic substances / Improvement of wettability / Cell culture, etc... 【Etching】 - Dry etching (resin, metal, ceramics) 【Film Formation】 - Formation of SiO2 films, hydrocarbon films, etc. 【Examples】 ☆Content - Hydrophilization and pre-treatment for adhesion of PTFE (Teflon) - Cleaning and pre-treatment for adhesion of glass - Cleaning and pre-treatment for adhesion of LSI - Cleaning and pre-treatment for adhesion of resin molded products - Substrate cleaning for solar cells and fuel cells - Terminal cleaning for organic EL, digital signage-related displays, and LCD substrates - Pre-treatment for wire bonding - Cleaning and pre-treatment for adhesion of films - Cleaning of MEMS, etc. - Pre-cleaning before plating - Pre-treatment for printing on paper - Cleaning of semiconductor plates - Cleaning of silicon wafers, etc...
Company information
KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.
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