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  6. General metal mirror finish silica polishing material "CLEALITE"

General metal mirror finish silica polishing material "CLEALITE"

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last updated:Jan 22, 2019

フジミインコーポレーテッド
フジミインコーポレーテッド
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For general metals such as copper, aluminum, stainless steel, and titanium!

The mirror finish material "CLEALITE" is a mirror finishing material for general metals. "2340" is a polishing slurry that can achieve a surface roughness of 10nm (Rmax) and a scratch-free surface through mechanochemical polishing action with a special composition liquid. "S" was developed as a final polishing slurry specifically for metal materials, balancing a composition liquid that suppresses selective processing with a base of well-dispersed silica powder. 【Key Points】 ■ For general metals such as copper, aluminum, stainless steel, and titanium ■ 【Type "2340"】 ・Average particle size SEM: 15.0 ・pH: 10.0 ・Specific gravity: 1.210 ■ 【Type "S"】 ・Average particle size SEM: 72.0 ・pH: 8.8 ・Specific gravity: 1.200 *For more details, please refer to the PDF document or feel free to contact us.

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CLEALITE.JPG

General metal mirror finish silica polishing material "CLEALITE"

CLEALITE.JPG
CLEALITE.JPG
  • Related Link - http://www.fujimiinc.co.jp/
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Polishing slurry for metals and metal oxides "CLEALITE Series"

Polishing slurry for metals and metal oxides "CLEALITE Series"

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FZ & CLEALITE Catalog

FZ & CLEALITE Catalog

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フジミインコーポレーテッド

フジミインコーポレーテッド

Electronic Components and Semiconductors

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Fujimi Incorporated has been a pioneer in the precision artificial abrasive materials industry since its founding in 1950, continuing its unique journey by leveraging classification technology and other advancements. The products born from accumulated know-how and research and development capabilities have evolved from polishing materials for optical lenses to essential components in advanced industries requiring high precision, such as mirror polishing of semiconductor substrates represented by silicon wafers, CMP (Chemical Mechanical Planarization) necessary for multilayer wiring of semiconductor chips, and polishing of hard disks for computers. Recently, we have also been actively engaged in the development of polishing and grinding materials for surface processing in fields such as LED, displays, and power electronics, as well as in applied areas utilizing powder technology. Additionally, we provide thermal spray materials for various industries, including steel, aerospace, and semiconductors.

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