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  6. Abrasive processing material: oxide materials for abrasive processing

Abrasive processing material: oxide materials for abrasive processing

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last updated:Jan 09, 2020

日本エクシード
日本エクシード
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It is possible to polish various oxide semiconductor crystals.

Our company possesses the capability to handle processing technology for mass production. Additionally, we also perform polishing processes for substrates used in blue light-emitting diodes and laser diodes. We carry out lapping and polishing processes on a mass production basis to meet the processing specifications required for various applications. 【Processing Details】 ■ Material Names: LiTaO3 (LT), LiNbO3 (LN), ZnO, Quartz, Sapphire, Sapphire Reclaimed, etc. ■ Processing Materials: LiNbO3 (LN), LiTaO3 (LT), ZnO, Quartz, Al2O3 (Sapphire) Backside processing of patterned wafers, reclamation processing, etc. ■ Supported Sizes ・Φ63mm to Φ150mm ・3mm×3mm to 100mm×100mm ■ Finished Thickness: 20μm and above ■ Flatness: TTV: 5μm or less *For more details, please download the materials or contact us.

    WaferdiodeProcessing Contract
酸化物.jpg

Abrasive processing material: oxide materials for abrasive processing

酸化物.jpg
酸化物.jpg

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Oxide wafer

Oxide wafer

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日本エクシード

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Electronic Components and Semiconductors

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EXCEED has the meaning of surpassing everything. Our company name, which carries that meaning, reflects our attitude and commitment to our work. We are constantly exploring polishing techniques that exceed limits and aspire to master the world of polishing. More flat, more smooth, more thin, more beautiful. New possibilities arise from polishing techniques that transcend various fields, as well as from our accumulated experience.

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