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  6. Film thickness control processing

Film thickness control processing

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last updated:Sep 25, 2019

日本エクシード
日本エクシード
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It is possible to control the thickness of the formed film in units of several tens of nanometers.

- Thickness control of films such as SiO2 and SiN - Thickness variation after processing: less than 50 nm

    Circuit board design and manufacturingothers
膜見本.jpg

Film thickness control processing

膜見本.jpg
膜見本.jpg

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basic information

We will take on the challenge of polishing all materials, including magnetic materials, superconducting materials, and new materials. If you have any requests, please feel free to contact us.

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※The delivery date may vary depending on the quantity, so please feel free to contact us.

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日本エクシード

日本エクシード

Electronic Components and Semiconductors

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EXCEED has the meaning of surpassing everything. Our company name, which carries that meaning, reflects our attitude and commitment to our work. We are constantly exploring polishing techniques that exceed limits and aspire to master the world of polishing. More flat, more smooth, more thin, more beautiful. New possibilities arise from polishing techniques that transcend various fields, as well as from our accumulated experience.

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