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  6. Control of CMP processes and grinding processes in the semiconductor industry.

Control of CMP processes and grinding processes in the semiconductor industry.

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last updated:Nov 26, 2025

プレシテック・ジャパン
プレシテック・ジャパン
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The "CHRocodile 2 IT sensor" can measure the thickness of wafers during work processing.

In the semiconductor industry, it is necessary to measure the physical thickness of wafers at multiple manufacturing stages, such as CMP and mechanical grinding. To monitor and optimize the entire process, it is important to have a grasp of the thickness; however, this task is currently mainly performed using mechanical contact probes. These probes have significant drawbacks, including the need for contact with the wafer, surface damage, and reference values for thickness measurement from the chuck table, and they also wear out, necessitating frequent replacements. Our "CHRocodile 2 IT sensor" can measure the thickness of wafers during processing using non-contact, non-destructive optical measurement technology. 【Features】 - Optical sensor provides more accurate results than conventional contact measurement devices. - Direct feedback improves the reproducibility of wafer thickness from several micrometers to less than 0.5 micrometers. - High-speed measurement and non-contact passive probes allow for the acquisition of a large amount of thickness data across the entire wafer area simply by moving the probe over the sample. - Variability in wafer thickness is revealed from the results, enabling the management of variability during the grinding process. *Product details can be viewed in the materials available for download in PDF format.

    Sensors
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Control of CMP processes and grinding processes in the semiconductor industry.

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  • Related Link - https://www.precitec.de/jp/products/optical-measur…
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【Other Features】 ■ Operators can achieve a high grinding rate, resulting in a significant reduction in processing time. ■ At the end of the process, the rate can be lowered again to maintain a smooth finish on the wafer. *For more details, please refer to the PDF document or feel free to contact us.

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[Keywords: Applications, Measurement Items, Benefits, etc.] Non-contact sensors, optical sensors, confocal, spectral interference method, thickness, thin films, thick films, gaps, height, surface roughness, flatness, TTV, shape, appearance, edges, slopes, measurement, inspection, high speed, 3D, line sensors, line scan, area scan, full surface, small, compact, inexpensive, high precision, inline, monitoring, in-situ, during processing, before and after processing, polishing, offline, standalone machines, tabletop machines, sampling, embedded, semiconductors, wafers, wafer bonding, Si wafers, Si, GaAs, InP, SiC, LiNbO3 (LN), LiTaO3 (LT), GaN, SiP, Al2O3 (sapphire), transparent, transparent bodies, gloss, mirror finish, easy.

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Control of CMP processes and grinding processes in the semiconductor industry.

Control of CMP processes and grinding processes in the semiconductor industry.

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Case Study Collection: Thickness Measurement and 3D Shape Measurement of Semiconductor Wafers Using Non-Contact Sensors

Case Study Collection: Thickness Measurement and 3D Shape Measurement of Semiconductor Wafers Using Non-Contact Sensors

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Presitech CHRocodile Sensor Lineup Spectral Interference Thickness Measurement

Presitech CHRocodile Sensor Lineup Spectral Interference Thickness Measurement

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2026 OPIE Exhibition Information

  • Seminar・Event

We will be exhibiting at OPIE 26' held at Pacifico Yokohama from April 22 to 24. Our booth will be L-37 (Light and Imaging Sensor & Imaging EXPO). We plan to showcase the 3D line sensor CLS2, a single-point thickness sensor, a distance sensor, and Enovasense, which can measure the thickness of opaque objects.

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Semicon Japan 2024

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We will be exhibiting at Semicon Japan 2024, which will be held at Tokyo Big Sight from December 11 (Wednesday) to December 12 (Friday). If you are interested, please come to the venue. ■ Products to be exhibited 1. Spectral interference optical thickness sensor CHRocodile 2 DW/ 2IT 2. Area scanner for measuring the thickness and shape of 12" wafers - Flying Spot Scanner (FSS) 3. Chromatic aberration confocal optical line sensor CLS2.0 4. Chromatic aberration confocal line camera CVC 5. Chromatic aberration confocal optical single-point sensor CHRocodile Mini 6. Non-contact thickness measurement sensor for opaque materials Enovasnese 7. Sensor for detecting internal defects non-contactly - Field sensor

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The 1st Kyushu Semiconductor Industry Exhibition

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We will be exhibiting at the Kyushu Semiconductor Industry Exhibition held at Marine Messe Fukuoka on September 25 (Wednesday) and September 26 (Thursday), 2024. If you are interested, please come to the venue. ■ Products to be exhibited - Spectral interference optical thickness sensor CHRocodile 2 DW/2IT - Chromatic aberration confocal optical line sensor CLS2.0 - Chromatic aberration confocal optical single-point sensor CHRocodile 2S, C, Mini *This time, there will be no actual display of the FSS for 12" wafer thickness mapping measurement, but if you need an explanation or would like to request a demo, please come to our booth.

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プレシテック・ジャパン

プレシテック・ジャパン

Testing, Analysis and Measurement

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Presitech is a specialist in laser material processing and optical measurement technology. We are not just a supplier of systems and components, but a professional partner in ensuring a smooth processing process for our customers. We offer consultations from the foundational stage and accurately consult with customers on their requests and objectives. We understand that the key to success in unique processing processes lies in the four components of exhibition, monitoring, processing, and control. Only by doing so can we provide appropriate solutions for our customers' applications. Our high-quality products, such as laser processing heads, quality monitoring systems, and optical measurement systems for spacing/thickness measurement, allow customers to directly benefit from our decades of experience. Our optical sensors are characterized by the highest precision and dynamic adaptability. Furthermore, they detect accurate values even in high-speed measurements.

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