Research and development, manual equipment for small lot production! Equipped with a resist coating mechanism equivalent to that of automatic machines, unlike tabletop types!
This product is equipped with spin coating, HMDS treatment, baking, and cooling functions. Since we handle everything from design to manufacturing and sales in-house, we have achieved a low price for the equipment♪ This is an ideal manual device for customers who find it difficult to purchase an automatic machine or for those who do not need an automatic machine for small lots. Unlike tabletop types, it allows for resist application equivalent to that of an automatic machine, so when transitioning to an automatic machine, there is no need to establish new process conditions, and the same recipe can be used! It has a proven track record with a variety of chemicals including positive and negative resists, polyimide, SOG, wax, and silicone. There is also a significant track record of substrate transport with various materials such as Si (silicon), GaAs, InP, GaN, SiC, sapphire, ceramics, and SiO2 (glass)! 【Features】 ■ Achieves low cost with a manual resist coater ■ Compatible with substrates from 2 to 12 inches ■ Supports low to high viscosity (1.7cP to 10000cP) ■ Proven track record with a variety of chemicals ■ Reduced footprint (space-saving) ■ Numerous options for resist reduction *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Main Specifications】 ■ Spin Coating Unit: 1 set ■ Wafer Size: Φ2" to Φ12" ■ Resist Dropping Nozzle: 2 sets ■ Bake Unit: 2 sets (Max 200℃) ■ Cooling Unit: 1 set ■ Equipment Size: (Example) 1200×1000×1800 (Φ4" main body) 1600×2500×1800 (Φ12" main body) Many other options available! *For more details, please refer to the PDF document or feel free to contact us.
Price range
Delivery Time
※3 to 4 months (usually), but it may vary depending on the situation, so please feel free to contact us.
Applications/Examples of results
For more details, please refer to the PDF document or feel free to contact us.
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Company information
We specialize in the design, manufacturing, and sales of photoresist coating, exposure, and development equipment, as well as photolithography processes in general, including double-sided exposure devices. In particular, we possess high uniformity coating technology for substrates with uneven surfaces or V-grooves, as well as for square and irregularly shaped substrates. Furthermore, we have developed and are selling a peeling and lift-off device that prevents the occurrence of burrs and metal reattachment using high-pressure jet NMP. Additionally, we handle various coating devices such as polyimide, PBF, OCD, WAX, high-temperature baking devices, and spin dryer devices. We customize equipment according to customer specifications and budgets. We also sell various wafers and substrates.