Custom-made options are available to meet your needs for ion sources for MEMS processing equipment!
This product is a large ion source suitable for high-speed milling processing using a large-area ion beam. By adopting heat-resistant/low-sputter-rate electrode materials, it generates low-energy ampere-class ion beams. We offer custom-made solutions to meet your requirements. 【Features】 ■ Optimization of beam uniformity through charged particle trajectory simulation ■ Adoption of heat-resistant/low-sputter-rate electrode materials ■ Generation of low-energy ampere-class ion beams *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Device Specifications】 ■Discharge Method: Multipole Magnetic Field Type Thermal Cathode DC Discharge (ECR Plasma Source can also be installed) ■Beam Size: φ350mm ■Beam Specifications: 1keV × 2A *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Application Example】 ■Ion Source for MEMS Processing Equipment *For more details, please refer to the PDF document or feel free to contact us.
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Company information
Noberion Systems Co., Ltd. is a company that develops and manufactures plasma application devices and offers contract processing for special film deposition processes. As a technology development-oriented venture company, it is advancing the development of ECR (Electron Cyclotron Resonance) high-density plasma sources and ECR high-current ion beam sources to meet new technological needs using oxygen and various active gases.
