Supports multiple chambers according to production scale. Achieves uniform etching of wafers.
Automatic Acid and Alkali Cleaning Device Compatible Work Sizes: φ2 to 12 inches. Please consult us for special sizes such as square substrates. The cleaning process is achieved by directly using two types of concentrated solutions through a two-fluid mixing nozzle. By adjusting the mixing ratio, it is possible to raise the temperature to the desired level using the reaction heat. 【Other Features】 ■ Capable of manufacturing devices with brush cleaning functions ■ Capable of manufacturing photo mask cleaning devices ■ Chemical supply and recovery unit can be integrated into the main device ■ Ozone water cleaning available as an option ■ Nanobubble cleaning available as an option You can conduct tests at our Tokyo Test Center. (Online support available) *For more details, please download the PDF (catalog) or feel free to contact us.
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For more details, please download the PDF (catalog) or feel free to contact us.
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Semiconductor manufacturing process, electronic materials manufacturing process, etc.
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Walking hand-in-hand with customers, challenging for creation of new values across a wide range of fields– DALTON’s existence, with the dual business domains of laboratory equipment and industrial machinery, truly shines as we play the role of a partner to customers who have strong passion for creating new values. A long with our unique group firms and suppliers, we have built a long history of trust with our customers who’ve been the main players to create new values insociety. -Creating new values together.- Dalton Group are pooling our knowledge and technology together, merging it with our customers’creative endeavors to create new and innovative values that contribute to an affluent society and abright future.
