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  6. □■□【MiniLab-080】Flexible Thin Film Experiment Device□■□

□■□【MiniLab-080】Flexible Thin Film Experiment Device□■□

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MiniLab-080

last updated:Jul 28, 2026

テルモセラ・ジャパン 本社
テルモセラ・ジャパン 本社
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Flexible configuration available upon request for processes such as evaporation, sputtering, and EB. Adopts a tall chamber with a height of 570mm, contributing to improved uniformity during evaporation.

The ML-080, composed of a D-type box chamber with a volume of 80 liters and dimensions of 400(W)x400(D)x570(H)mm, features a higher chamber compared to the 060 model, resulting in a longer TS distance adjustment range and improved film uniformity during deposition on large-diameter substrates. It is an optimal model for vacuum deposition and is a higher-end version of the ML-060, which can also accommodate a load lock mechanism. Like the 060, it is compact yet supports a wide range of applications including resistance heating deposition (for metals, insulators, and organic materials), EB deposition, RF/DC/Pulse DC compatible magnetron sputtering, RIE plasma etching, and annealing. - Maximum substrate size: Φ10 inch - Resistance heating deposition sources: up to 4 sources - Organic deposition sources: up to 4 sources - Magnetron sputtering cathodes: 4 sources - Electron beam deposition - Substrate heating stage (standard 500℃, max 1000℃) - *Plasma etching / <30W soft etching *Plasma etching can be installed in both the main chamber and the load lock chamber.

    Evaporation Equipment
MiniLab-080-550_2020.jpg

□■□【MiniLab-080】Flexible Thin Film Experiment Device□■□

MiniLab-080-550_2020.jpg
MiniLab-080-550_2020.jpg MiniLab-080-550_2020.jpg 1.jpg 2.jpg 5.jpg LTE-Feature-1.png MiniLab080.1057.jpg MiniLab080.1060.jpg 9.jpg LL-etching-stage.png
  • Thermosera Japan_MiniLab-080 publication page
  • Special site - Product/service details - https://pr.mono.ipros.com/thermocera/product/

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basic information

【Main Specifications】 - SUS304 80ℓ volume 400x400x570mm front-loading chamber - Pump: Turbo molecular pump, rotary pump (dry pump also available) - Vacuum exhaust: Automatic control of vacuum/vent - Resistance heating deposition: Up to 4 source points (Model TE1 to TE4 deposition sources) - Organic deposition: Up to 4 sources (Model LTEC-1cc/5cc) - EB electron beam deposition source: 7cc crucible x 6 (or 4cc crucible x 8) - Φ2 to 4 inch magnetron sputtering cathode x up to 4 sources - Process control: Manual or automatic multilayer continuous film deposition/multiple simultaneous film deposition, APC automatic control - Film thickness monitor: Quartz crystal oscillator sensor head x 4 - Film thickness control: Inficon SQM-160 (or SQC-310) multi-channel film deposition controller - Utilities: Power supply 200V three-phase 15A, water cooling 3ℓ/min, N2 vent 0.1Mkpa - Other options: Substrate heating, cooling, substrate elevation/rotation, dry etching, dry scroll pump, load lock mechanism

Price information

This device is a customized product and will vary depending on the configuration, so please contact us for inquiries.

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Please contact us for details

※This device is a customized product and will vary based on the configuration, so please contact us for inquiries.

Applications/Examples of results

Various basic experimental applications in university and corporate research laboratories - Optical thin films - Electrode films, semiconductor films, wiring films, insulating films Others

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Product image of the nanoPVD-T15A vacuum deposition device.

◆nanoPVD-T15A◆ High-performance organic and metal film deposition device

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Ideal for organic thin film deposition applications such as OLED, OPV, and OTFT. Utilizes low-temperature organic deposition sources with excellent temperature responsiveness/stability and deposition sources for metal films. Centralized management of various settings with PLC automatic control via simple touch panel operation. An intuitive HMI that allows anyone to operate without complicated procedures. Connects to PC via USB cable, allowing for log and CSV file saving, and creation, registration, and storage of deposition recipes. ◉ Compact size: 804(W) x 530(D) x 600(H)mm ◉ Weight: 40kg to 70kg (depending on equipment configuration) ◉ Excellent basic performance - Achieves vacuum level of 5x10-5 Pascal - Equipped with a high-performance turbo molecular pump - Supports Φ2 inch or Φ4 inch substrates ◉ Deposition sources - Resistance heating deposition source TE x up to 2 units - Organic deposition source LTE x up to 4 units (if mixed with resistance heating TE, up to 2 units) ◉ 7" touch panel ◉ Continuous film formation - Automatic control of film formation programs - Registration of 30 types of recipes - High-precision wide-range vacuum gauge ◉ Abundant options - Substrate rotation - Vertical lift with 300mm stroke - Substrate shutter - Dry pump (RP standard)

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nanoPVD_Dimensions: 804(W) x 570(D) x 600(H)mm Body weight: approximately 70kg

◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇

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This is a research and development RF/DC magnetron sputtering device. Despite its high performance and multifunctionality, it fits into limited laboratory space with a compact size and easy operation via a 7-inch front touch panel. ● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes to 1x10^-4 Pa!) ● Film uniformity: ±3% ● Various options: up/down rotation, heater, cathode for magnetic materials, and more ● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, allowing for versatile applications such as multilayer films and simultaneous deposition. - Insulating films - Conductive films - Compounds, etc. 【Main Features】 ◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source) ◉ 2" cathode x up to 3 sources ◉ Easy operation via touch panel with PLC automatic program control ◉ High-precision APC process control with MFC ◉ Up to 3 MFC systems ◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC. ◉ Vacuum system: TMP + RP (*dry pump option) ◉ Substrate rotation, vertical lift, and heating (Max 500℃) ◉ Quartz crystal film thickness monitor/controller

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MiniLab-WCF Ultra-High Temperature Wafer Annealing Furnace Image

MiniLab-WCF Ultra High Temperature Wafer Annealing Furnace Max 2000℃_Dedicated for High-Temperature Wafer Sintering (6inch to 8inch)

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Max 2000℃ Φ6〜8 inch wafer dedicated high-temperature annealing device, capable of small-scale production multi-atmosphere wafer annealing device. ◾️ Max 2000℃ ◾️ Effective heating range: Φ6〜Φ8 inch single wafer type or batch type (multi-stage 5 wafer cassette) ◾️ Heater control: 1 zone or 2 zones (cascade control) ◾️ Heater materials: ・C/C composite: Φ6〜Φ8 inch ・PG coating high-purity graphite: Φ6〜Φ8 inch ◾️ Operating atmosphere: ・Vacuum (1x10-2Pa), inert gas (Ar, N2) ◾️ PLC semi-automatic operation ・Automatic sequence control for vacuum/purge cycle and venting ・Fully automatic operation (optional) ・Touch panel operation, allowing centralized management without dispersed operations. ◾️ Process pressure control ・APC control (MFC flow or automatic opening adjustment valve PID loop control) ・Maximum 3 systems of MFC flow automatic control, or manual adjustment of float meter/needle valve ◾️ PLOT screen graph display, CSV data output

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MiniLab-060 Thin Film Experiment Device

★【MiniLab-060】Flexible Thin Film Experimental Device★ Thermosera Japan

  • UPDATE
  • Catalog news

Compact/Space-saving, High-spec 60L volume multi-thin film experimental device capable of incorporating various thin film modules such as deposition, sputtering, EB, and annealing, suitable for a wide range of applications. Compact/Space-saving, High-spec thin film experimental device. Combinations possible from the following deposition sources: - Resistance heating deposition source x up to 4 - Organic deposition source x up to 4 - Electron beam deposition - 2-inch magnetron sputtering cathode x 4 - Plasma etching: can be installed in either the main chamber or the load lock chamber. 【Small Footprint/Space-saving】 - Dual rack type (MiniLab-060): 1200(W) x 590(D)mm 【Excellent Operability/Intuitive Operation Screen】 Windows PC or 7” touch panel. Easy operation regardless of skill level, with maximum safety considerations.

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テルモセラ・ジャパン

テルモセラ・ジャパン 本社

Industrial Electrical Equipment

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【Endless possibility_thermal engineering...】 Our company sells vacuum thin film devices for semiconductor and electronic device fundamental research, ultra-high temperature heaters for CVD substrate heating, experimental furnaces, temperature measurement equipment, and more. To meet the endless demand for "heat," which is indispensable in any era, and to respond to various requests in the field of fundamental technology development, we aim to introduce the latest equipment and contribute to research and development in Japan.

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