We will introduce a device capable of forming low-damage, high-quality thin films through a high route.
The "PGS Model" is a revolutionary sputtering device that employs the pressure gradient phenomenon. It enables sputter deposition in a high vacuum environment. Additionally, it can form low-damage, high-quality thin films through a high route. This product is the result of collaborative research with Kyushu University, Meijo University, and Okayama University of Science. 【Features】 ■ Utilizes the pressure gradient phenomenon ■ Enables sputter deposition in a high vacuum environment ■ Result of collaborative research with Kyushu University, Meijo University, and Okayama University of Science *For more details, please refer to the PDF materials or feel free to contact us.
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【Technical Details (Partial)】 ■ Position of plasma gas introduction: Sputter cathode ■ Plasma density: High ■ Substrate to target distance: 150–200mm ■ Mean free path: Long ■ Plasma damage to substrate: Minimal, etc. *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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